SCHEMBL6928667

SCHEMBL6928667

CCC(Cl)(Cl)C(=O)N(Cl)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
MEN1 O00255 2/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C9 P11712 1/20 0.43
CYP2C19 P33261 1/20 0.43
ALDH1A1 P00352 5/20 0.43
GLA P06280 1/20 0.43
TSHR P16473 1/20 0.43
HTT P42858 3/20 0.40
LMNA P02545 3/20 0.40
RIPK1 Q13546 2/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
POLB P06746 1/20 0.39
TP53 P04637 3/20 0.39
JAK2 O60674 1/20 0.36
PAX8 Q06710 1/20 0.36
OPRM1 P35372 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6932838 0.86 ALDH1A1 (0.43) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL6933247 0.79 KMT2A (0.47) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL7891308 0.77 NPSR1 (0.41) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL8798649 0.76 NPSR1 (0.40) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL8177657 0.75 NOTUM (0.42) KMT2ASMN1; SMN2MEN1ALDH1A1TSHR
SCHEMBL5533132 0.73 CES1 (0.43) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL3156128 0.73 ALDH1A1 (0.48) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL3154354 0.70 TP53 (0.62) KMT2ASMN1; SMN2MEN1ALDH1A1GLA
SCHEMBL20360661 0.70 ALDH1A1 (0.55) KMT2ASMN1; SMN2MEN1CYP3A4CYP2C9
SCHEMBL16599595 0.70 ALDH1A1 (0.55) KMT2AMEN1ALDH1A1GLATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed