SCHEMBL6929094

SCHEMBL6929094

CC(=O)c1ccc(NC(=O)C(Cl)(Cl)Cl)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 10/20 0.58
KMT2A Q03164 7/20 0.58
NPC1 O15118 7/20 0.58
MEN1 O00255 6/20 0.58
SMN1; SMN2 Q16637 6/20 0.58
RAB9A P51151 5/20 0.58
ALDH1A1 P00352 4/20 0.58
HTT P42858 2/20 0.58
MAPK1 P28482 2/20 0.58
NLRP1 Q9C000 1/20 0.58
HPGD P15428 1/20 0.58
TAAR1 Q96RJ0 1/20 0.55
L3MBTL1 Q9Y468 1/20 0.50
LMNA P02545 2/20 0.47
TP53 P04637 1/20 0.47
CA12 O43570 1/20 0.47
CA1 P00915 1/20 0.47
CA2 P00918 1/20 0.47
CA9 Q16790 1/20 0.47
POLB P06746 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8828273 0.82 KMT2A (0.65) MAPTKMT2AMEN1ALDH1A1HTT
SCHEMBL8782956 0.82 L3MBTL1 (0.76) MAPTKMT2ANPC1MEN1SMN1; SMN2
SCHEMBL7428282 0.81 MAPT (0.60) MAPTKMT2ANPC1MEN1SMN1; SMN2
SCHEMBL27893900 0.81 L3MBTL1 (0.55) MAPTKMT2ANPC1MEN1SMN1; SMN2
SCHEMBL6931963 0.80 KMT2A (0.60) MAPTKMT2ANPC1MEN1SMN1; SMN2
SCHEMBL9094456 0.79 MAPT (0.51) MAPTKMT2ANPC1MEN1SMN1; SMN2
Triclacetamol SCHEMBL29385347 0.78 MAPT (0.63) MAPTKMT2ANPC1MEN1RAB9A
SCHEMBL28966117 0.78 MAPT (0.63) MAPTKMT2ANPC1MEN1SMN1; SMN2
SCHEMBL3633396 0.77 NPC1 (0.84) MAPTKMT2ANPC1MEN1SMN1; SMN2
SCHEMBL474757 0.77 ALDH1A1 (0.70) MAPTKMT2ANPC1MEN1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed