SCHEMBL6931963

SCHEMBL6931963

CC(=O)c1cccc(NC(=O)C(Cl)(Cl)Cl)c1

nearest known ligand 0.61

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.60
MEN1 O00255 4/20 0.60
NPSR1 Q6W5P4 2/20 0.58
TDP1 Q9NUW8 1/20 0.58
ALDH1A1 P00352 5/20 0.57
NPC1 O15118 2/20 0.55
RAB9A P51151 2/20 0.55
SMN1; SMN2 Q16637 2/20 0.54
MAPK1 P28482 3/20 0.54
CREBBP Q92793 1/20 0.54
HPGD P15428 2/20 0.53
HTT P42858 2/20 0.53
MAPT P10636 1/20 0.53
POLB P06746 1/20 0.53
CYP1A2 P05177 1/20 0.53
LMNA P02545 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3798155 0.84 NPSR1 (0.81) KMT2AMEN1NPSR1TDP1ALDH1A1
SCHEMBL1875367 0.83 L3MBTL1 (0.73) KMT2AMEN1NPSR1TDP1ALDH1A1
SCHEMBL21133077 0.81 HSD17B10 (0.62) KMT2AMEN1NPSR1ALDH1A1RAB9A
SCHEMBL6929094 0.80 MAPT (0.58) KMT2AMEN1ALDH1A1NPC1RAB9A
SCHEMBL474709 0.80 KMT2A (0.70) KMT2AMEN1NPSR1TDP1ALDH1A1
SCHEMBL5340030 0.80 MEN1 (0.89) KMT2AMEN1TDP1ALDH1A1NPC1
SCHEMBL11871933 0.79 ALDH1A1 (0.59) KMT2AMEN1ALDH1A1NPC1RAB9A
SCHEMBL4102809 0.78 KMT2A (0.73) KMT2AMEN1NPSR1TDP1ALDH1A1
SCHEMBL11423971 0.77 DDX3X (0.65) KMT2AMEN1NPSR1TDP1ALDH1A1
SCHEMBL22472037 0.77 MEN1 (0.61) KMT2AMEN1ALDH1A1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed