SCHEMBL6931875

SCHEMBL6931875

Cc1cc(C(C)(C)O)ccc1-c1ccc(C(C)(C)O)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ABL1 P00519 1/20 0.44
▸ ESR2 Q92731 2/20 0.42
▸ HSD17B1 P14061 1/20 0.41
▸ ESR1 P03372 2/20 0.40
▸ RORC P51449 2/20 0.39
▸ TNKS O95271 7/20 0.39
▸ TNKS2 Q9H2K2 7/20 0.39
▸ PARP1 P09874 6/20 0.39
▸ ADORA3 P0DMS8 1/20 0.39
▸ SLC6A3 Q01959 1/20 0.39
▸ PARP6 Q2NL67 1/20 0.39
▸ PARP10 Q53GL7 1/20 0.39
▸ TIPARP Q7Z3E1 1/20 0.39
▸ PARP8 Q8N3A8 1/20 0.39
▸ PARP12 Q9H0J9 1/20 0.39
▸ PARP11 Q9NR21 1/20 0.39
▸ PARP2 Q9UGN5 1/20 0.39
▸ PARP3 Q9Y6F1 1/20 0.39
▸ CNR1 P21554 1/20 0.39
▸ CNR2 P34972 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21787408 0.89 CNR1 (0.44) ABL1ESR2HSD17B1ESR1RORC
SCHEMBL10094725 0.82 CA12 (0.46) ESR2TNKSTNKS2PARP1ADORA3
SCHEMBL547767 0.77 KIF11 (0.44) ABL1ESR2ESR1TNKSTNKS2
SCHEMBL18802754 0.77 KIF11 (0.44) ABL1ESR2ESR1TNKSTNKS2
SCHEMBL187252 0.76 ESR1 (0.56) ESR2HSD17B1ESR1SLC6A3CNR1
SCHEMBL12051657 0.75 ESR1 (0.44) ESR2ESR1SLC6A3CNR1CNR2
SCHEMBL2653612 0.75 ESR2 (0.61) ESR2HSD17B1ESR1
SCHEMBL23956482 0.75 ABL1 (0.42) ABL1
SCHEMBL196799 0.74 MEN1 (0.48) ABL1ESR2ESR1TNKSTNKS2
SCHEMBL17754362 0.73 TSHR (0.52) ABL1TNKSTNKS2PARP1ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 — — EP disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 — — US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 — — EP disclosed
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