⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11041667 | 0.96 | ACE (0.36) | — | |
| SCHEMBL7198148 | 0.85 | — | — | |
| SCHEMBL9227938 | 0.84 | — | — | |
| SCHEMBL127466 | 0.84 | — | — | |
| SCHEMBL6976745 | 0.82 | — | — | |
| SCHEMBL7426321 | 0.82 | MAPT (0.41) | — | |
| SCHEMBL9864154 | 0.82 | ALDH1A1 (0.56) | — | |
| SCHEMBL1412938 | 0.80 | — | — | |
| SCHEMBL6032277 | 0.80 | GPR84 (0.46) | — | |
| SCHEMBL9219475 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4551382-A | POLYESTERURETHANE AND ACRYLIC OR VINYL POLYMER | RHONE-POULENC SPECIALITES CHIMIQUES (FR) | 1985-11-05 | — | — | US | claimed |
| US-4150946-A | ABRASION RESISTANT TEXTILES | RHONE-POULENC INDUSTRIES (FR) | 1979-04-24 | — | — | US | claimed |
| CN-111278896-A | Thermosetting resin composition and method for producing same | 堺化学工业株式会社 | 2020-06-12 | — | — | CN | disclosed |
| EP-0894780-B1 | Use of radiation-curable compositions for coating mineral bodies | BASF AG (DE) | 2003-11-26 | — | — | EP | disclosed |
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6136383-A | UV RADIATION OR ELECTRON BEAMS CURING THE COATINGS COMPRISING AT LEAST ONE POLYMER WHICH HAS ETHYLENICALLY UNSATURATED DOUBLE BONDS; PREVENT EFFLORESCENCE AND WEATHERPROOFING | BASF AKTIENGESELLSCHAFT (DE) | 2000-10-24 | — | — | US | disclosed |
| EP-0894780-A1 | Use of radiation-curable compositions for coating mineral bodies | BASF AKTIENGESELLSCHAFT (DE) | 1999-02-03 | — | — | EP | disclosed |
| US-4150946-A | ABRASION RESISTANT TEXTILES | RHONE-POULENC INDUSTRIES (FR) | 1979-04-24 | — | — | US | disclosed |