SCHEMBL6932181

SCHEMBL6932181

c1ccc([S+](c2ccccc2)c2ccccc2Sc2ccccc2[S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8567943 0.98
SCHEMBL298034 0.89 SIRT1 (0.40)
Hydrochloric Acid SCHEMBL8980364 0.87 SIRT1 (0.39)
SCHEMBL3201612 0.85 SIRT1 (0.40)
SCHEMBL29848318 0.82 SIRT1 (0.36)
SCHEMBL3189008 0.82 ALDH1A1 (0.35)
SCHEMBL12570083 0.81 KDM4E (0.34)
SCHEMBL3213151 0.77 ALDH1A1 (0.35)
SCHEMBL5849458 0.76 MAPT (0.37)
SCHEMBL1977182 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4247472-A Method for producing bis-[4-(diphenylsulfonic)phenyl]sulfide bis-MF6 photoinitiator AMERICAN CAN COMPANY (US) 1981-01-27 US claimed
US-20140162044-A1 ADHESIVE FILM FOR POLARIZING PLATE, ADHESIVE COMPOSITION FOR THE SAME, POLARIZING PLATE COMPRISING THE SAME, AND OPTICAL DISPLAY APPARATUS COMPRISING THE SAME CHEIL INDUSTRIES INC. (KR) 2014-06-12 US disclosed
EP-1158363-B1 Positive resist composition and onium salts of saccharin derivatives FUJIFILM CORP (JP) 2014-01-22 EP disclosed
US-6605409-B2 Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power FUJI PHOTO FILM CO., LTD. (JP) 2003-08-12 US disclosed
US-20020006578-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-01-17 US disclosed
EP-1158363-A1 Positive resist composition and onium salts of saccharin derivatives FUJI PHOTO FILM CO., LTD. (JP) 2001-11-28 EP disclosed
US-4400541-A Process for preparing bis-(diphenylsulfoniophenyl)-sulfide bis-chloride THE SOUTHLAND CORPORATION (US) 1983-08-23 US disclosed
US-4247472-A Method for producing bis-[4-(diphenylsulfonic)phenyl]sulfide bis-MF6 photoinitiator AMERICAN CAN COMPANY (US) 1981-01-27 US disclosed