Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.81 |
| ▸ | LMNA | P02545 | 6/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.58 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.58 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.58 |
| ▸ | SLC15A2 | Q16348 | 1/20 | 0.50 |
| ▸ | EGLN1 | Q9GZT9 | 3/20 | 0.47 |
| ▸ | ALKBH5 | Q6P6C2 | 1/20 | 0.47 |
| ▸ | SUCNR1 | Q9BXA5 | 1/20 | 0.47 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.45 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.45 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.45 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | LCK | P06239 | 1/20 | 0.44 |
| ▸ | FYN | P06241 | 1/20 | 0.44 |
| ▸ | FOLH1 | Q04609 | 1/20 | 0.43 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.42 |
| ▸ | KDM6B | O15054 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL95982 | 0.90 | TSHR (1.00) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| Acetic Acid SCHEMBL29175414 | 0.89 | TSHR (0.65) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| SCHEMBL16303292 | 0.88 | TSHR (0.72) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| Ammonia Solution, Strong SCHEMBL8958644 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| Selenium SCHEMBL30845448 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| SCHEMBL30845449 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| Hydrochloric Acid SCHEMBL10457214 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| Water SCHEMBL11221867 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| Hydrogen Sulfide SCHEMBL28318293 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 | |
| SCHEMBL342096 | 0.87 | TSHR (0.93) | TSHRLMNAKMT2AHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | claimed |
| CN-112424193-B | Episulfide compound and composition for optical material | 三菱瓦斯化学株式会社 | 2024-03-26 | — | — | CN | disclosed |
| WO-2024048634-A1 | COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, AND SOLID-STATE IMAGING DEVICE | 住友化学株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024048633-A1 | COMPOSITION, CURED PRODUCT, DISPLAY DEVICE, AND SOLID-STATE IMAGING ELEMENT | 住友化学株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024048632-A1 | COMPOUND AND METHOD FOR PRODUCING SAME | 住友化学株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024048635-A1 | COMPOUND AND METHOD FOR PRODUCING SAME | 住友化学株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024048631-A1 | COMPOUND AND METHOD FOR PRODUCING SAME | 住友化学株式会社 | 2024-03-07 | — | — | WO | disclosed |
| US-11858920-B2 | Episulfide compound and composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-01-02 | — | — | US | disclosed |
| EP-3828181-B1 | EPISULFIDE COMPOUND AND COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2022-07-20 | — | — | EP | disclosed |
| US-20210340129-A1 | EPISULFIDE COMPOUND AND COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-11-04 | — | — | US | disclosed |
| US-20150259477-A1 | NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-09-17 | — | — | US | disclosed |
| EP-2902389-A1 | NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION | Mitsubishi Gas Chemical Company, Inc. (JP) | 2015-08-05 | — | — | EP | disclosed |
| CN-104768942-A | Novel episulfide compound and optical material composition | MITSUBISHI GAS CHEMICAL CO | 2015-07-08 | — | — | CN | disclosed |
| CN-103703044-B | Composition for optical material, and method for producing same | MITSUBISHI GAS CHEMICAL CO | 2015-03-18 | — | — | CN | disclosed |
| CN-103703044-A | Composition for optical material, and method for producing same | MITSUBISHI GAS CHEMICAL CO | 2014-04-02 | — | — | CN | disclosed |
| EP-0980696-B1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-11-26 | — | — | EP | disclosed |
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | disclosed |
| US-6180753-B1 | ADDING ACIDS, CURING AND SOLIDIFICATION WITH CASTING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0980696-A1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-02-23 | — | — | EP | disclosed |
| EP-0928802-A2 | Process for tinting a resin having a large refractivity index and optical material tinted by the process | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-07-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210340129-A1 | EPISULFIDE COMPOUND AND COMPOSITION FOR OPTICAL MATERIAL | PRXL2A, SPTBN1, SMC2 | TSHR 4713/4885LMNA 1843/4885KMT2A 2073/4885 |
| US-11858920-B2 | Episulfide compound and composition for optical material | PRXL2A, SPTBN1, SMC2 | TSHR 4713/4885LMNA 1843/4885KMT2A 2073/4885 |
| US-20150259477-A1 | NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION | RPL21, SLC11A2, INCENP | TSHR 4875/4885LMNA 3190/4885KMT2A 921/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.