⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18116910 | 0.86 | — | — | |
| SCHEMBL27599460 | 0.75 | — | — | |
| SCHEMBL28189922 | 0.73 | — | — | |
| SCHEMBL18116981 | 0.73 | — | — | |
| SCHEMBL18116959 | 0.73 | NPSR1 (0.37) | — | |
| SCHEMBL7746423 | 0.72 | HSD17B10 (0.34) | — | |
| SCHEMBL2296087 | 0.71 | — | — | |
| SCHEMBL6911257 | 0.70 | — | — | |
| SCHEMBL6308981 | 0.69 | FAAH (0.39) | — | |
| SCHEMBL11268469 | 0.69 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111295736-A | Method for manufacturing high-definition pattern and method for manufacturing display device using same | 默克专利有限公司 | 2020-06-16 | — | — | CN | disclosed |
| CN-111247624-A | Method for manufacturing fine pattern and method for manufacturing display device using the same | 默克专利有限公司 | 2020-06-05 | — | — | CN | disclosed |
| US-10287419-B2 | Rubber composition and vulcanization aid | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-05-14 | — | — | US | disclosed |
| US-20170130028-A1 | RUBBER COMPOSITION AND VULCANIZATION AID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20170130028-A1 | RUBBER COMPOSITION AND VULCANIZATION AID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-11 | — | — | US | disclosed |
| EP-3075777-A1 | RUBBER COMPOSITION AND VULCANIZATION AID | Sumitomo Chemical Company Limited (JP) | 2016-10-05 | — | — | EP | disclosed |
| US-9017930-B2 | Pattern formation method and guide pattern material | KABUSHIKI KAISHA TOSHIBA (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20130183828-A1 | PATTERN FORMATION METHOD AND GUIDE PATTERN MATERIAL | TOSHIBA MEMORY CORPORATION (JP) | 2013-07-18 | — | — | US | disclosed |
| US-20090014034-A1 | BENEFIT COMPOSITIONS AND FORMALDEHYDE SCAVENGERS FOR SAME | THE PROCTER & GAMBLE COMPANY | 2009-01-15 | — | — | US | disclosed |
| US-6593063-B1 | Method of manufacturing a semiconductor device having an improved fine structure | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-07-15 | — | — | US | disclosed |
| US-6579657-B1 | Material for forming a fine pattern and method for manufacturing a semiconductor device using the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2003-06-17 | — | — | US | disclosed |
| US-6319853-B1 | Method of manufacturing a semiconductor device using a minute resist pattern, and a semiconductor device manufactured thereby | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 2001-11-20 | — | — | US | disclosed |