SCHEMBL6940172

SCHEMBL6940172

CC(C)(c1ccc2c(c1)C(=O)N(OS(=O)(=O)C(F)(F)F)C2=O)c1ccc2c(c1)C(=O)N(OS(=O)(=O)C(F)(F)F)C2=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.40
KDM4E B2RXH2 5/20 0.40
MAPT P10636 5/20 0.40
ALDH1A1 P00352 5/20 0.40
F2 P00734 3/20 0.40
HPGD P15428 3/20 0.40
MEN1 O00255 3/20 0.40
HTT P42858 2/20 0.40
LMNA P02545 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
CA1 P00915 4/20 0.39
CA9 Q16790 4/20 0.39
CA12 O43570 3/20 0.39
CA2 P00918 3/20 0.39
XBP1 P17861 2/20 0.38
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2C19 P33261 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
VDR P11473 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6669505 0.86 KMT2A (0.39) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL3826285 0.86 KMT2A (0.39) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL3825306 0.79 TDP1 (0.47) KMT2AKDM4EMAPTALDH1A1HPGD
SCHEMBL18698971 0.79 KDM4E (0.38) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL64157 0.78 ALDH1A1 (0.61) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL29368754 0.78 ALDH1A1 (0.61) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL14537323 0.78 CA1 (0.32) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL12541257 0.77 CA9 (0.43) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL21972545 0.76 KDM4E (0.36) KMT2AKDM4EMAPTALDH1A1F2
SCHEMBL2382168 0.76 KDM4E (0.47) KMT2AKDM4EMAPTALDH1A1F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6582879-B2 Specified photo acid generating agent used in heat resistant photoresist composition which contains polyamide oligomer containing ester groups as pendant groups; minimize post-exposure baking process and post-exposure delay effect KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2003-06-24 US disclosed
US-20030064315-A1 Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY 2003-04-03 US disclosed