Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 11/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 10/20 | 0.61 |
| ▸ | MAPT | P10636 | 9/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.61 |
| ▸ | HPGD | P15428 | 7/20 | 0.61 |
| ▸ | MEN1 | O00255 | 5/20 | 0.56 |
| ▸ | VDR | P11473 | 3/20 | 0.51 |
| ▸ | F2 | P00734 | 4/20 | 0.47 |
| ▸ | HTT | P42858 | 3/20 | 0.47 |
| ▸ | XBP1 | P17861 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL64157 | 1.00 | ALDH1A1 (0.61) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL11291012 | 0.93 | ALDH1A1 (0.54) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL2382168 | 0.86 | KDM4E (0.47) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL215202 | 0.85 | ALDH1A1 (0.64) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL29713407 | 0.85 | ALDH1A1 (0.64) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL7134479 | 0.84 | KDM4E (0.52) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL7642860 | 0.83 | ALDH1A1 (0.50) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL382979 | 0.82 | PTGS2 (0.41) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL1470558 | 0.82 | KMT2A (0.49) | ALDH1A1KDM4EMAPTKMT2AHPGD | |
| SCHEMBL14322543 | 0.82 | KMT2A (0.49) | ALDH1A1KDM4EMAPTKMT2AHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 128 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-113582846-B | Photoresist monomer, preparation method thereof and photoresist | 安徽熙泰智能科技有限公司 | 2023-11-24 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| CN-110286561-B | Radiation-sensitive composition, cured film, and display element | JSR株式会社 | 2025-06-03 | — | — | CN | disclosed |
| CN-120077771-A | Curable composition for organic EL element, cured product for organic EL element, method for producing cured product for organic EL element, and polymer | JSR株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-114341215-A | Curable composition | 株式会社日本触媒 | 2022-04-12 | — | — | CN | disclosed |
| CN-114326302-A | Photosensitive resin composition | 味之素株式会社 | 2022-04-12 | — | — | CN | disclosed |
| CN-110892296-B | Composition for forming infrared-transmitting film, method for forming infrared-transmitting film, protective plate for display device, and display device | JSR株式会社 | 2022-03-22 | — | — | CN | disclosed |
| CN-114207524-A | Resin composition, dry film, resist film, compound, acid generator, and method for producing N-organic sulfonyloxy compound | 东京应化工业株式会社 | 2022-03-18 | — | — | CN | disclosed |
| CN-108885399-B | Negative photosensitive resin composition, cured film, display device provided with cured film, and method for producing same | 东丽株式会社 | 2022-03-15 | — | — | CN | disclosed |
| CN-114040948-A | Composition for forming gate insulating film | 默克专利有限公司 | 2022-02-11 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |