SCHEMBL6941647

SCHEMBL6941647

COc1cccc(C2=NC(c3cc(F)cc(F)c3F)(C3(c4cc(F)cc(F)c4F)N=C(c4cccc(OC)c4)C(c4cccc(OC)c4)=N3)N=C2c2cccc(OC)c2)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DYRK1A Q13627 1/20 0.40
CLK4 Q9HAZ1 1/20 0.40
ADORA2A P29274 2/20 0.40
ADORA1 P30542 1/20 0.40
NPY5R Q15761 1/20 0.39
KDM1A O60341 2/20 0.38
KDM1B Q8NB78 2/20 0.38
PDE2A O00408 1/20 0.38
PDE10A Q9Y233 1/20 0.38
RPS6KA3 P51812 1/20 0.38
AKR1C3 P42330 1/20 0.38
AKR1C2 P52895 1/20 0.38
ALDH1A3 P47895 1/20 0.37
XDH P47989 1/20 0.36
BACE1 P56817 3/20 0.36
KCNH2 Q12809 1/20 0.36
SQOR Q9Y6N5 1/20 0.36
HSD17B1 P14061 1/20 0.36
HSD17B2 P37059 1/20 0.36
NOTUM Q6P988 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29510931 1.00 DYRK1A (0.40) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL6935532 0.88 DYRK1A (0.41) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL29897699 0.88 DYRK1A (0.41) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL29508349 0.86 DYRK1A (0.44) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL6935491 0.86 DYRK1A (0.44) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL6938978 0.85 BACE1 (0.45) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL29450716 0.85 BACE1 (0.45) DYRK1ACLK4NPY5RKDM1AKDM1B
SCHEMBL6937716 0.85 BACE1 (0.45) DYRK1ACLK4NPY5RKDM1AKDM1B
SCHEMBL29450715 0.85 BACE1 (0.45) DYRK1ACLK4ADORA2AADORA1NPY5R
SCHEMBL6935907 0.83 ADORA2A (0.43) DYRK1ACLK4ADORA2AADORA1NPY5R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE FUJIFILM CORPORATION (JP) 2026-05-28 US disclosed
WO-2026100708-A1 PHOTOSENSITIVE RESIN LAMINATE, PHOTOSENSITIVE ELEMENT, AND PATTERN FORMING METHOD 旭化成株式会社 2026-05-15 WO disclosed
WO-2025105281-A1 PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE PRODUCTION METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-05-22 WO disclosed
WO-2025095102-A1 PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN 旭化成株式会社 2025-05-08 WO disclosed
WO-2025074970-A1 PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING BOARD 旭化成株式会社 2025-04-10 WO disclosed
WO-2025047730-A1 TRANSFER FILM, PATTERN FORMATION METHOD, LAMINATE, SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-03-06 WO disclosed
WO-2025005146-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND LIKE 旭化成株式会社 2025-01-02 WO disclosed
WO-2024214816-A1 PHOTOSENSITIVE RESIN LAMINATE AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-10-17 WO disclosed
WO-2024177101-A1 PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-08-29 WO disclosed
WO-2024085254-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN 旭化成株式会社 2024-04-25 WO disclosed
US-20240059803-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-22 US disclosed
CN-110446976-B Photosensitive resin composition 旭化成株式会社 2023-03-24 CN disclosed
WO-2022186389-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME 旭化成株式会社 2022-09-09 WO disclosed
CN-107924128-A Photosensitive polymer combination 旭化成株式会社 2018-04-17 CN disclosed
US-6524770-B1 For polyimide precursor curable under patternwise low radiation; heat and chemical resistance; polyamide having unsaturated ester pendant groups cures HITACHI CHEMICAL CO., LTD. (JP) 2003-02-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE LCP1, PCNA, FDFT1 DYRK1A 3660/4885CLK4 4144/4885ADORA2A 4643/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.