Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BACE1 | P56817 | 3/20 | 0.45 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.43 |
| ▸ | CLK4 | Q9HAZ1 | 2/20 | 0.41 |
| ▸ | DYRK1A | Q13627 | 1/20 | 0.41 |
| ▸ | BACE2 | Q9Y5Z0 | 1/20 | 0.41 |
| ▸ | ADORA2A | P29274 | 2/20 | 0.40 |
| ▸ | ALDH1A3 | P47895 | 2/20 | 0.40 |
| ▸ | SQOR | Q9Y6N5 | 1/20 | 0.39 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.39 |
| ▸ | KDM1A | O60341 | 2/20 | 0.39 |
| ▸ | KDM1B | Q8NB78 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.38 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29450715 | 1.00 | BACE1 (0.45) | BACE1NPY5RCLK4DYRK1ABACE2 | |
| SCHEMBL29450716 | 0.89 | BACE1 (0.45) | BACE1NPY5RCLK4DYRK1AALDH1A3 | |
| SCHEMBL6937716 | 0.89 | BACE1 (0.45) | BACE1NPY5RCLK4DYRK1AALDH1A3 | |
| SCHEMBL6941655 | 0.86 | DYRK1A (0.43) | BACE1NPY5RCLK4DYRK1ABACE2 | |
| SCHEMBL29417503 | 0.86 | DYRK1A (0.43) | BACE1NPY5RCLK4DYRK1ABACE2 | |
| SCHEMBL29510957 | 0.86 | DYRK1A (0.43) | BACE1NPY5RCLK4DYRK1ABACE2 | |
| SCHEMBL6941966 | 0.86 | DYRK1A (0.43) | BACE1NPY5RCLK4DYRK1ABACE2 | |
| SCHEMBL6942517 | 0.86 | NR3C1 (0.45) | BACE1CYP3A4MAPK1HSD17B10 | |
| SCHEMBL29510931 | 0.85 | DYRK1A (0.40) | BACE1NPY5RCLK4DYRK1ABACE2 | |
| SCHEMBL6941647 | 0.85 | DYRK1A (0.40) | BACE1NPY5RCLK4DYRK1ABACE2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147277-A1 | TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | FUJIFILM CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-20250306461-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | RESONAC CORPORATION (JP) | 2025-10-02 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| WO-2025095102-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING WIRING BOARD HAVING CONDUCTOR PATTERN | 旭化成株式会社 | 2025-05-08 | — | — | WO | disclosed |
| WO-2025074970-A1 | PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING BOARD | 旭化成株式会社 | 2025-04-10 | — | — | WO | disclosed |
| WO-2025005146-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, METHOD FOR FORMING RESIST PATTERN, AND LIKE | 旭化成株式会社 | 2025-01-02 | — | — | WO | disclosed |
| US-20240392048-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | RESONAC CORP (JP) | 2024-11-28 | — | — | US | disclosed |
| WO-2024176305-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | 株式会社レゾナック | 2024-08-29 | — | — | WO | disclosed |
| WO-2024085254-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN MULTILAYER BODY, AND METHOD FOR FORMING RESIST PATTERN | 旭化成株式会社 | 2024-04-25 | — | — | WO | disclosed |
| EP-4357852-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | Resonac Corporation (JP) | 2024-04-24 | — | — | EP | disclosed |
| US-20240111211-A1 | PHOTOSENSITIVE RESIN FILM, RESIST PATTERN FORMING METHOD, AND WIRING PATTERN FORMING METHOD | RESONAC CORPORATION (JP) | 2024-04-04 | — | — | US | disclosed |
| US-20240059803-A1 | PHOTOSENSITIVE RESIN MULTILAYER BODY AND METHOD FOR PRODUCING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-02-22 | — | — | US | disclosed |
| US-20230393476-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | RESONAC CORPORATION (JP) | 2023-12-07 | — | — | US | disclosed |
| US-20230288802-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2023-09-14 | — | — | US | disclosed |
| US-20230273518-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| WO-2023136333-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, AND RESIST PATTERN FORMATION METHOD | 旭化成株式会社 | 2023-07-20 | — | — | WO | disclosed |
| WO-2022264275-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING PHOTOSENSITIVE ELEMENT | 昭和電工マテリアルズ株式会社 | 2022-12-22 | — | — | WO | disclosed |
| US-6524770-B1 | For polyimide precursor curable under patternwise low radiation; heat and chemical resistance; polyamide having unsaturated ester pendant groups cures | HITACHI CHEMICAL CO., LTD. (JP) | 2003-02-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | BACE1 1861/4885NPY5R 2168/4885CLK4 1753/4885 |
| US-20260147277-A1 | TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE | LCP1, PCNA, FDFT1 | BACE1 4087/4885NPY5R 3062/4885CLK4 4144/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.