Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 11/20 | 0.59 |
| ▸ | ESR2 | Q92731 | 10/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.59 |
| ▸ | KIF11 | P52732 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | TYR | P14679 | 1/20 | 0.44 |
| ▸ | AR | P10275 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.44 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.44 |
| ▸ | HTR6 | P50406 | 1/20 | 0.44 |
| ▸ | ESRRG | P62508 | 1/20 | 0.44 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | SHBG | P04278 | 1/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6814948 | 1.00 | ESR1 (0.59) | ESR1ESR2CYP3A4ALDH1A1KIF11 | |
| SCHEMBL20421308 | 0.94 | ESR1 (0.53) | ESR1ESR2CYP3A4ALDH1A1KIF11 | |
| SCHEMBL505601 | 0.91 | ESR1 (0.65) | ESR1ESR2CYP3A4ALDH1A1LMNA | |
| SCHEMBL15085255 | 0.91 | ESR1 (0.50) | ESR1ESR2CYP3A4ALDH1A1KIF11 | |
| SCHEMBL10771866 | 0.90 | MMP3 (0.58) | ESR1ESR2CYP3A4ALDH1A1KIF11 | |
| SCHEMBL32675855 | 0.88 | ESR1 (0.62) | ESR1ESR2CYP3A4ALDH1A1KIF11 | |
| SCHEMBL1971090 | 0.86 | KCNN4 (0.48) | ALDH1A1KIF11TSHR | |
| SCHEMBL10598204 | 0.85 | ESR1 (0.57) | ESR1ESR2CYP3A4ALDH1A1KIF11 | |
| SCHEMBL10772677 | 0.84 | ESR1 (0.58) | ESR1ESR2CYP3A4KIF11LMNA | |
| SCHEMBL12004549 | 0.84 | ESR1 (0.58) | ESR1ESR2CYP3A4KIF11LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 246 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025070215-A1 | LIQUID CRYSTALLINE RESIN AND LIQUID CRYSTALLINE RESIN COMPOSITION | ポリプラスチックス株式会社 | 2025-04-03 | — | — | WO | claimed |
| EP-2137140-B1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL SCIENT IND RES (IN) | 2010-11-10 | — | — | EP | claimed |
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2010-04-01 | — | — | US | claimed |
| EP-2137140-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | Council of Scientific&Industrial Research (IN) | 2009-12-30 | — | — | EP | claimed |
| WO-2008117308-A2 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH (IN) | 2008-10-02 | — | — | WO | claimed |
| EP-0177713-B2 | POLYCARBONATE AND OPTICAL DISC SUBSTRATE | MITSUBISHI KASEI CORPORATION (JP) | 1992-06-10 | — | — | EP | claimed |
| EP-0177713-B1 | POLYCARBONATE AND OPTICAL DISC SUBSTRATE | MITSUBISHI KASEI CORPORATION (JP) | 1989-05-31 | — | — | EP | claimed |
| US-4775739-A | IMPROVED FLOWABILITY | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1988-10-04 | — | — | US | claimed |
| US-4734488-A | MONOMER HAVING PENDANT AROMATIC GROUP | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) | 1988-03-29 | — | — | US | claimed |
| EP-4692938-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT | TAIYO HOLDINGS CO., LTD. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-3904079-B1 | GAS BARRIER LAMINATE | LINTEC CORP (JP) | 2025-10-29 | — | — | EP | disclosed |
| EP-4079808-B1 | MOLDED ARTICLE FOR LASER WELDING, AND AGENT FOR SUPPRESSING VARIATION IN LASER TRANSMITTANCE OF MOLDED ARTICLE FOR LASER WELDING | POLYPLASTICS CO (JP) | 2025-06-11 | — | — | EP | disclosed |
| US-20250122374-A1 | FLAME-RETARDANT POLYCARBONATE RESIN COMPOSITION AND MOLDED PRODUCT THEREOF | TEIJIN LIMITED (JP) | 2025-04-17 | — | — | US | disclosed |
| WO-2025074791-A1 | POLY(BUTYLENE TEREPHTHALATE) RESIN COMPOSITION | ポリプラスチックス株式会社 | 2025-04-10 | — | — | WO | disclosed |
| EP-0348744-A2 | Trialkylsilyloxy-1,1-disphenyl-ethylenes and polymers prepared therewith | BAYER AG (DE) | 1990-01-03 | — | — | EP | disclosed |
| US-4880855-A | DISCOLORATION INHIBITION | GENERAL ELECTRIC COMPANY (US) | 1989-11-14 | — | — | US | disclosed |
| US-4775739-A | IMPROVED FLOWABILITY | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1988-10-04 | — | — | US | disclosed |
| US-4748151-A | SUBLIMING DYE, POLYCARBONATE BINDER | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1988-05-31 | — | — | US | disclosed |
| US-4734488-A | MONOMER HAVING PENDANT AROMATIC GROUP | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JP) | 1988-03-29 | — | — | US | disclosed |
| EP-0177713-A1 | Polycarbonate and optical disc substrate | MITSUBISHI KASEI CORPORATION (JP) | 1986-04-16 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100081084-A1 | NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF | NRP1, NR4A1, SNX1 | ESR1 175/4885ESR2 885/4885CYP3A4 2297/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.