SCHEMBL6960494

SCHEMBL6960494

N=C(NN)c1cc(=O)c2ccccc2o1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A2 P19784 3/20 0.61
CSNK2B P67870 3/20 0.61
CSNK2A1 P68400 3/20 0.61
CSNK2A3 Q8NEV1 3/20 0.61
KDM4E B2RXH2 1/20 0.61
USP2 O75604 1/20 0.61
PTGS1 P23219 1/20 0.61
MAOA P21397 2/20 0.56
MAOB P27338 2/20 0.56
LMNA P02545 2/20 0.55
MEN1 O00255 5/20 0.55
KMT2A Q03164 5/20 0.55
NPC1 O15118 4/20 0.55
RAB9A P51151 4/20 0.55
POLB P06746 3/20 0.55
MAPT P10636 3/20 0.55
ALDH1A1 P00352 2/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
HTT P42858 2/20 0.55
RECQL P46063 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6960234 0.81 AKR1B1 (0.63) KDM4EMAOAMAOBMEN1KMT2A
SCHEMBL6952111 0.80 ALDH1A1 (0.64) KDM4EMAOAMAOBLMNANPC1
SCHEMBL6961865 0.78 POLH (0.58) KDM4EMEN1KMT2AMAPTALDH1A1
SCHEMBL6386648 0.78 CSNK2A2 (0.72) CSNK2A2CSNK2BCSNK2A1CSNK2A3KDM4E
SCHEMBL6960638 0.77 MAOB (0.57) MAOAMAOBMEN1KMT2ANPC1
Chromocarb SCHEMBL432304 0.76 KDM4E (1.00) CSNK2A2CSNK2BCSNK2A1CSNK2A3KDM4E
SCHEMBL1532188 0.76 KDM4E (0.74) CSNK2A2CSNK2BCSNK2A1CSNK2A3KDM4E
Chromocarb SCHEMBL29355904 0.76 KDM4E (1.00) CSNK2A2CSNK2BCSNK2A1CSNK2A3KDM4E
SCHEMBL29569747 0.76 KDM4E (0.74) CSNK2A2CSNK2BCSNK2A1CSNK2A3KDM4E
SCHEMBL4970562 0.75 MAOB (0.82) CSNK2A2CSNK2BCSNK2A1CSNK2A3KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0711762-B1 PROCESS FOR PRODUCING TETRAZOLE COMPOUNDS SUMITOMO CHEMICAL CO (JP) 2003-08-06 EP disclosed
US-6277998-B1 REACTING 2-CYANO-4-OXO-4H-BENZOPYRAN COMPOUND WITH HYDROGEN SULFIDE AND THEN REACTING PROUDCT WITH ALKYL HALIDE; REACTING THE PRODUCT WITH HYDRAZINE OR ITS SALT AND THEN WITH NITROUS ACID COMPOUND TO OBTAIN TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-08-21 US disclosed
US-6191289-B1 REACTING A 4-OXO-4H-BENZOPYRAN GROUP SUBSTITUTED WITH AMIDE OR A PHENYL GROUP IN ITS 2 POSITION IS REACTED WITH ANHYDROUS HYDRAZINE OR SALT IN PRESENCE OF CATALYST FOLLOWED BY REACTING WITH NITROUS ACID OR SALT TO FORM TETRAZOLE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-02-20 US disclosed
US-5874593-A SULFUR CONTAINING AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-02-23 US disclosed
EP-0711762-A1 PROCESS FOR PRODUCING TETRAZOLE COMPOUND AND INTERMEDIATE THEREFOR SUMITOMO CHEMICAL COMPANY LIMITED (JP) 1996-05-15 EP disclosed