Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.50 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.50 |
| ▸ | BRPF1 | P55201 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.48 |
| ▸ | HPGD | P15428 | 3/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.47 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.47 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.47 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.47 |
| ▸ | DHFR | P00374 | 1/20 | 0.47 |
| ▸ | MPO | P05164 | 1/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.47 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31519420 | 1.00 | ESR1 (0.50) | ESR1ESR2BRPF1ALDH1A1HSD17B10 | |
| SCHEMBL29515031 | 0.83 | KMT2A (0.52) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL310386 | 0.83 | KMT2A (0.52) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL9864607 | 0.83 | ESR1 (0.52) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL29407046 | 0.81 | TRPA1 (0.46) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL29357094 | 0.81 | ALDH1A1 (0.65) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL25550174 | 0.81 | MYC (0.44) | BRPF1ALDH1A1HSD17B10HPGDKDM4E | |
| SCHEMBL501719 | 0.81 | ESR1 (0.50) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL715998 | 0.81 | TRPA1 (0.46) | ESR1ESR2ALDH1A1HSD17B10HPGD | |
| SCHEMBL56188 | 0.81 | ALDH1A1 (0.65) | ESR1ESR2ALDH1A1HSD17B10HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 156 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023115621-A1 | METHOD FOR PREPARING Α-HALOGENATED ACETOPHENONE COMPOUND UNDER CATALYSIS OF IONIC LIQUID [TEA][TFOH]2 | 大连大学 | 2023-06-29 | — | — | WO | claimed |
| CN-115028519-A | Novel synthesis method of dexmedetomidine intermediate 2, 3-dimethylacetophenone | 南京亿华药业有限公司 | 2022-09-09 | — | — | CN | claimed |
| CN-114181088-A | Ionic liquid (TEA)][TfOH]2Method for preparing alpha-halogenated acetophenone compounds by catalysis | 大连大学 | 2022-03-15 | — | — | CN | claimed |
| US-12522696-B2 | Bisphenol composition and polycarbonate resin | MITSUBISHI CHEMICAL CORPORATION (JP) | 2026-01-13 | — | — | US | disclosed |
| US-12215189-B2 | Bisphenol composition and polycarbonate resin | MITSUBISHI CHEMICAL CORPORATION (JP) | 2025-02-04 | — | — | US | disclosed |
| CN-115968391-B | Composition, resin, method for producing amorphous film, method for forming resist pattern, method for producing underlayer film for lithography, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-112218844-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| US-20240117102-A1 | POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| US-20240117101-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| CN-113574042-B | Bisphenol composition and polycarbonate resin | 三菱化学株式会社 | 2023-10-13 | — | — | CN | disclosed |
| CN-113574041-B | Bisphenol production method and polycarbonate resin production method | 三菱化学株式会社 | 2023-10-13 | — | — | CN | disclosed |
| CN-1434834-A | Photocurable composition and method for producing the same, photocurable pressure-sensitive adhesive sheet and method for producing the same, and method for bonding | SEKISUI CHEMICAL CO LTD (JP) | 2003-08-06 | — | — | CN | disclosed |
| US-20030139600-A1 | 2-pyridylsilane, processes for producing and using the same | SUMITOMO CHEMICAL CO., LTD. | 2003-07-24 | — | — | US | disclosed |
| US-6548673-B1 | Alkylation using transition metal complex catalyst; purified by acid/base extraction | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-6531602-B2 | Desilylation of a 2-pyridylsilane to form an alcohol | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-03-11 | — | — | US | disclosed |
| US-20020165397-A1 | 2-Pyridylsilane, processes for producing and using the same | SUMITOMO CHEMICAL CO., LTD. | 2002-11-07 | — | — | US | disclosed |
| EP-1035125-A2 | 2-Pyridylsilane, processes for producing and using the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-09-13 | — | — | EP | disclosed |
| CN-1041415-C | 3-arylbenzofuranone stabilizers and uses thereof | CIBA GEIGY AG (CH) | 1998-12-30 | — | — | CN | disclosed |
| CN-1074909-A | UVA-absorbing sunscreen metal complexes | RICHARDSON VICKS INC (US) | 1993-08-04 | — | — | CN | disclosed |
| EP-0164593-B1 | ANTI-INFLAMMATORY PHTHALAZINONES | FISONS CORPORATION (US) | 1989-11-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020165397-A1 | 2-Pyridylsilane, processes for producing and using the same | H1-0, RIOK2, H1-4 | ESR1 4502/4885ESR2 3867/4885BRPF1 460/4885 |
| US-12215189-B2 | Bisphenol composition and polycarbonate resin | SUZ12, RB1, RRP12 | ESR1 71/4885ESR2 36/4885BRPF1 81/4885 |
| US-20030139600-A1 | 2-pyridylsilane, processes for producing and using the same | H1-0, H1-4, H1-2 | ESR1 4521/4885ESR2 3952/4885BRPF1 394/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.