⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6987031 | 0.69 | — | — | |
| SCHEMBL5021296 | 0.62 | SIGMAR1 (0.50) | — | |
| SCHEMBL5021300 | 0.62 | — | — | |
| SCHEMBL7332054 | 0.62 | — | — | |
| SCHEMBL7534654 | 0.58 | — | — | |
| SCHEMBL30574445 | 0.52 | CDC25B (0.30) | — | |
| SCHEMBL29846477 | 0.52 | CDC25B (0.30) | — | |
| SCHEMBL1324800 | 0.52 | ALDH1A1 (0.42) | — | |
| SCHEMBL860617 | 0.49 | — | — | |
| SCHEMBL11937438 | 0.49 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2146359-B1 | Solid electrolytic capacitor and method for producing the same | MURATA MANUFACTURING CO (JP) | 2012-05-16 | — | — | EP | disclosed |
| EP-2146359-A1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2010-01-20 | — | — | EP | disclosed |
| EP-1988556-B1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KK (JP) | 2010-01-13 | — | — | EP | disclosed |
| EP-0971382-B1 | SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF | SHOWA DENKO KK (JP) | 2009-04-22 | — | — | EP | disclosed |
| EP-1988556-A2 | Solid electrolytic capacitor and method for producing the same | Showa Denko K.K. (JP) | 2008-11-05 | — | — | EP | disclosed |
| US-7175781-B2 | Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance | SHOWA DENKO K.K. (JP) | 2007-02-13 | — | — | US | disclosed |
| US-7175781-B2 | Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance | SHOWA DENKO K.K. (JP) | 2007-02-13 | — | — | US | disclosed |