Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 2/20 | 0.44 |
| ▸ | LCK | P06239 | 1/20 | 0.44 |
| ▸ | FYN | P06241 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | GGT1 | P19440 | 1/20 | 0.36 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.35 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | HMGCR | P04035 | 1/20 | 0.35 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.35 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.35 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | GRM4 | Q14833 | 1/20 | 0.35 |
| ▸ | ARG1 | P05089 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL10949299 | 0.97 | FFAR3 (0.41) | FFAR3LCKFYNALDH1A1MEN1 | |
| Bicarbonate SCHEMBL8038848 | 0.90 | ALDH1A1 (0.42) | FFAR3ALDH1A1MEN1CYP1A2KMT2A | |
| Bicarbonate SCHEMBL8042430 | 0.90 | ALDH1A1 (0.42) | FFAR3ALDH1A1MEN1CYP1A2KMT2A | |
| Acetic Acid SCHEMBL10762669 | 0.88 | FFAR3 (0.44) | FFAR3LCKFYNALDH1A1MEN1 | |
| Carbamic Acid SCHEMBL21058277 | 0.88 | ACHE (0.44) | FFAR3ALDH1A1MEN1CYP1A2KMT2A | |
| Oxalic Acid SCHEMBL10594364 | 0.88 | ALDH1A1 (0.41) | FFAR3ALDH1A1MEN1CYP1A2KMT2A | |
| Pivalate SCHEMBL4918285 | 0.85 | ALDH1A1 (0.44) | FFAR3ALDH1A1MEN1CYP1A2KMT2A | |
| Acetic Acid SCHEMBL4621908 | 0.85 | FFAR3 (0.41) | FFAR3LCKFYNALDH1A1MEN1 | |
| Propionic Acid SCHEMBL5571646 | 0.85 | FFAR3 (0.59) | FFAR3ALDH1A1MEN1CYP1A2KMT2A | |
| Acetic Acid SCHEMBL28664506 | 0.84 | FFAR3 (0.47) | FFAR3LCKFYNALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5393386-A | Method for preparing aqueous quaternary ammonium hydroxide solution | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-02-28 | — | — | US | claimed |
| EP-4269122-B1 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSORS AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-3991988-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-11-05 | — | — | EP | disclosed |
| EP-3991984-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD FOR PREPARING A LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORP (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-12365173-B2 | Lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method | FUJIFILM CORPORATION (JP) | 2025-07-22 | — | — | US | disclosed |
| EP-4039489-B1 | PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR MANUFACTURING PLANOGRAPHIC PRINTING PLATE, AND PLANOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-05-21 | — | — | EP | disclosed |
| EP-3991983-B1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR MANUFACTURING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-3991990-B1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PREPARING A LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORP (JP) | 2025-02-26 | — | — | EP | disclosed |
| US-12122177-B2 | Lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method | FUJIFILM CORPORATION (JP) | 2024-10-22 | — | — | US | disclosed |
| US-12117729-B2 | On-press development type lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method | FUJIFILM CORPORATION (JP) | 2024-10-15 | — | — | US | disclosed |
| US-20100248140-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| EP-2223804-A2 | Lithographic printing plate precursor and plate making method thereof | FUJIFILM Corporation (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-20100212524-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2010-08-26 | — | — | US | disclosed |
| US-20070135565-A1 | COMPOSITION FOR FORMING POROUS FILM, POROUS FILM AND METHOD FOR FORMING THE SAME, INTERLEVEL INSULATOR FILM, AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-7132473-B2 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| EP-1568744-A1 | COMPOSITION FOR POROUS FILM FORMATION, POROUS FILM, PROCESS FOR PRODUCING THE SAME, INTERLAYER INSULATION FILM AND SEMICONDUCTOR DEVICE | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-08-31 | — | — | EP | disclosed |
| US-20040219372-A1 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-11-04 | — | — | US | disclosed |
| EP-0608545-B1 | Method for preparing aqueous quaternary ammonium hydroxide solution | MITSUBISHI GAS CHEMICAL CO (JP) | 1997-04-16 | — | — | EP | disclosed |
| US-5393386-A | Method for preparing aqueous quaternary ammonium hydroxide solution | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-02-28 | — | — | US | disclosed |
| EP-0608545-A1 | Method for preparing aqueous quaternary ammonium hydroxide solution | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1994-08-03 | — | — | EP | disclosed |