Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 6/20 | 0.48 |
| ▸ | MCHR1 | Q99705 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | APAF1 | O14727 | 1/20 | 0.46 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.46 |
| ▸ | RAD52 | P43351 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.45 |
| ▸ | HTT | P42858 | 2/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | ALB | P02768 | 1/20 | 0.42 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.42 |
| ▸ | S1PR3 | Q99500 | 1/20 | 0.42 |
| ▸ | CNR2 | P34972 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2150523 | 1.00 | DNM1 (0.48) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| SCHEMBL2150179 | 1.00 | DNM1 (0.48) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| SCHEMBL8723518 | 1.00 | DNM1 (0.48) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| Cetrimonium SCHEMBL583796 | 1.00 | DNM1 (0.48) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| Cetrimonium SCHEMBL27594384 | 0.98 | DNM1 (0.47) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| Cetrimonium SCHEMBL28609301 | 0.98 | DNM1 (0.47) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| SCHEMBL28880276 | 0.95 | LMNA (0.45) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| Cetrimonium SCHEMBL27594385 | 0.93 | LMNA (0.52) | DNM1MCHR1ALDH1A1APAF1HSP90AA1 | |
| SCHEMBL2150307 | 0.92 | MCHR1 (0.47) | DNM1MCHR1ALDH1A1LMNACYP2C9 | |
| SCHEMBL2150494 | 0.92 | HTT (0.47) | DNM1MCHR1ALDH1A1HSP90AA1RAD52 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 277 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160185595-A1 | AQUEOUS FORMULATIONS FOR REMOVING METAL HARD MASK AND POST-ETCH RESIDUE WITH Cu/W COMPATIBILITY | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | claimed |
| EP-3027709-A1 | AQUEOUS FORMULATIONS FOR REMOVING METAL HARD MASK AND POST-ETCH RESIDUE WITH Cu/W COMPATIBILITY | Advanced Technology Materials, Inc. (US) | 2016-06-08 | — | — | EP | claimed |
| WO-2015017659-A1 | AQUEOUS FORMULATIONS FOR REMOVING METAL HARD MASK AND POST-ETCH RESIDUE WITH Cu/W COMPATIBILITY | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-02-05 | — | — | WO | claimed |
| US-20250019590-A1 | NITRIDE ETCHANT COMPOSITION AND METHOD | ENTEGRIS, INC. | 2025-01-16 | — | — | US | disclosed |
| US-12152187-B2 | Nitride etchant composition and method | ENTEGRIS, INC. (US) | 2024-11-26 | — | — | US | disclosed |
| EP-4397501-A1 | ON-PRESS-DEVELOPING LITHOGRAPHIC PRINTING ORIGINAL PLATE, METHOD FOR PRODUCING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-117916096-A | On-press development type lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method | 富士胶片株式会社 | 2024-04-19 | — | — | CN | disclosed |
| US-11874602-B2 | Lithographic printing plate precursor, method for preparing lithographic printing plate, and lithographic printing method | FUJIFILM CORPORATION (JP) | 2024-01-16 | — | — | US | disclosed |
| US-20230384671-A1 | LAMINATE OF NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING NEGATIVE TONE LITHOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| EP-4269122-A1 | LAMINATE OF NEGATIVE LITHOGRAPHIC PRINTING PLATE ORIGINAL PLATE AND METHOD FOR MANUFACTURING NEGATIVE LITHOGRAPHIC PRINTING PLATE | FUJIFILM Corporation (JP) | 2023-11-01 | — | — | EP | disclosed |
| CN-113382870-B | Lithographic printing plate precursor, method for producing lithographic printing plate, and lithographic printing method | 富士胶片株式会社 | 2023-10-31 | — | — | CN | disclosed |
| EP-2236291-A1 | Lithographic printing plate precursor and plate making method thereof | Fujifilm Corporation (JP) | 2010-10-06 | — | — | EP | disclosed |
| US-20100248140-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20100248141-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| EP-2223804-A2 | Lithographic printing plate precursor and plate making method thereof | FUJIFILM Corporation (JP) | 2010-09-01 | — | — | EP | disclosed |
| US-20100212524-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF | FUJIFILM CORPORATION (JP) | 2010-08-26 | — | — | US | disclosed |
| EP-1134268-B1 | Antistatic composition | KAO CORP (JP) | 2008-03-12 | — | — | EP | disclosed |
| US-6620231-B2 | Mixture with polarity solvents; protective devices | KAO CORPORATION (JP) | 2003-09-16 | — | — | US | disclosed |
| US-20010034390-A1 | Antistatic composition | KAO CORPORATION (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1134268-A1 | Antistatic composition | KAO CORPORATION (JP) | 2001-09-19 | — | — | EP | disclosed |