Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2337022 | 1.00 | MEN1 (0.33) | MEN1KMT2A | |
| SCHEMBL2401381 | 0.79 | HTT (0.30) | — | |
| SCHEMBL167527 | 0.76 | — | — | |
| SCHEMBL12275125 | 0.74 | — | — | |
| SCHEMBL12275130 | 0.74 | — | — | |
| SCHEMBL2333591 | 0.72 | PDK1 (0.34) | — | |
| SCHEMBL2333583 | 0.72 | PDK1 (0.34) | — | |
| SCHEMBL1839680 | 0.70 | GRIK1 (0.31) | MEN1KMT2A | |
| SCHEMBL74357 | 0.70 | GRIK1 (0.31) | MEN1KMT2A | |
| SCHEMBL2871424 | 0.70 | GRIK1 (0.31) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9233840-B2 | Method for improving self-assembled polymer features | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-01-12 | — | — | US | claimed |
| US-8486489-B2 | Methods for aligning polymer films and related structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-16 | — | — | US | claimed |
| US-20090214823-A1 | METHODS FOR ALIGNING POLYMER FILMS AND RELATED STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-08-27 | — | — | US | claimed |
| CN-114835387-A | Glass toughening treatment process | 淄博泰康轻工制品有限公司 | 2022-08-02 | — | — | CN | disclosed |
| CN-114751656-A | Tempered glass and preparation method thereof | 淄博泰康轻工制品有限公司 | 2022-07-15 | — | — | CN | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| US-10180627-B2 | Processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-01-15 | — | — | US | disclosed |
| US-9802400-B2 | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-10-31 | — | — | US | disclosed |
| US-20170160637-A9 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2017-06-08 | — | — | US | disclosed |
| US-9507260-B2 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-11-29 | — | — | US | disclosed |
| US-9500950-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-11-22 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100112475-A1 | RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2010-05-06 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |
| US-20100047712-A1 | TOP ANTIREFLECTIVE COATING COMPOSITION CONTAINING HYDROPHOBIC AND ACIDIC GROUPS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-25 | — | — | US | disclosed |
| US-20100040974-A1 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20090202945-A1 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-08-13 | — | — | US | disclosed |