Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL701312 | 1.00 | MEN1 (0.33) | MEN1KMT2A | |
| SCHEMBL2401381 | 0.79 | HTT (0.30) | — | |
| SCHEMBL167527 | 0.76 | — | — | |
| SCHEMBL12275125 | 0.74 | — | — | |
| SCHEMBL12275130 | 0.74 | — | — | |
| SCHEMBL2333591 | 0.72 | PDK1 (0.34) | — | |
| SCHEMBL2333583 | 0.72 | PDK1 (0.34) | — | |
| SCHEMBL1839680 | 0.70 | GRIK1 (0.31) | MEN1KMT2A | |
| SCHEMBL74357 | 0.70 | GRIK1 (0.31) | MEN1KMT2A | |
| SCHEMBL2871424 | 0.70 | GRIK1 (0.31) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9802400-B2 | Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-10-31 | — | — | US | disclosed |
| US-9422445-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-08-23 | — | — | US | disclosed |
| US-20160053129-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | CENTRAL GLASS CO., LTD. (JP) | 2016-02-25 | — | — | US | disclosed |
| US-9223217-B2 | Sulfonamide-containing topcoat and photoresist additive compositions and methods of use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-12-29 | — | — | US | disclosed |
| US-20140377518-A1 | ORIENTATION CONTROL LAYER POLYMERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | DOW GLOBAL TECHNOLOGIES LLC (US) | 2014-12-25 | — | — | US | disclosed |
| US-8728706-B2 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORPORATION (JP) | 2014-05-20 | — | — | US | disclosed |
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | JSR CORPORATION (JP) | 2012-09-20 | — | — | US | disclosed |
| US-20110207051-A1 | Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120237875-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND | RER1, RDX, PRXL2A | MEN1 4432/4885KMT2A 1173/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.