Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TET2 | Q6N021 | 3/20 | 0.30 |
| ▸ | TET3 | O43151 | 1/20 | 0.30 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL418818 | 0.88 | KDM4E (0.35) | — | |
| SCHEMBL1089102 | 0.88 | ALDH1A1 (0.33) | — | |
| SCHEMBL4804370 | 0.82 | CYP1A2 (0.33) | — | |
| SCHEMBL19400064 | 0.77 | CYP1A2 (0.35) | — | |
| SCHEMBL704030 | 0.75 | ALDH1A1 (0.50) | — | |
| SCHEMBL3680659 | 0.72 | GAA (0.53) | — | |
| SCHEMBL1088144 | 0.68 | POLB (0.33) | — | |
| SCHEMBL1089318 | 0.67 | POLB (0.46) | — | |
| SCHEMBL5354981 | 0.67 | ALDH1A1 (0.39) | — | |
| SCHEMBL4579249 | 0.67 | MEN1 (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808974-B2 | Method for forming pattern | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100068650-A1 | POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION | JSR CORPORATION (JP) | 2010-03-18 | — | — | US | disclosed |