Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | BPTF | Q12830 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.41 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3680659 | 0.88 | GAA (0.53) | ALDH1A1KMT2AMEN1TSHRPOLB | |
| SCHEMBL5354981 | 0.86 | ALDH1A1 (0.39) | ALDH1A1BPTFSMN1; SMN2P2RX7CYP3A4 | |
| SCHEMBL6865023 | 0.84 | ALDH1A1 (0.38) | ALDH1A1BPTFSMN1; SMN2P2RX7CYP3A4 | |
| SCHEMBL1089318 | 0.82 | POLB (0.46) | ALDH1A1KMT2AMEN1TSHRPOLB | |
| SCHEMBL38655452 | 0.82 | ALDH1A1 (0.50) | ALDH1A1BPTFSMN1; SMN2P2RX7KMT2A | |
| SCHEMBL2409327 | 0.82 | EPHX2 (0.44) | ALDH1A1BPTFNPSR1KMT2AMEN1 | |
| SCHEMBL4582478 | 0.81 | ALDH1A1 (0.54) | ALDH1A1KMT2AMEN1TSHRPOLB | |
| SCHEMBL418818 | 0.80 | KDM4E (0.35) | ALDH1A1BPTFSMN1; SMN2P2RX7POLB | |
| SCHEMBL1089102 | 0.80 | ALDH1A1 (0.33) | ALDH1A1BPTFSMN1; SMN2P2RX7POLB | |
| SCHEMBL28056616 | 0.79 | ALDH1A1 (0.46) | ALDH1A1BPTFSMN1; SMN2P2RX7CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 265 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112011295-B | High-temperature-resistant acrylate pressure-sensitive adhesive and preparation method thereof | 永一胶粘(中山)有限公司 | 2021-09-17 | — | — | CN | claimed |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-09-14 | — | — | CN | claimed |
| CN-113150222-A | Fast-curing friction-resistant epoxy acrylic resin and preparation method thereof | 中科院广州化学有限公司 | 2021-07-23 | — | — | CN | claimed |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-04-20 | — | — | CN | claimed |
| CN-112011295-A | High-temperature-resistant acrylate pressure-sensitive adhesive and preparation method thereof | 永一胶粘(中山)有限公司 | 2020-12-01 | — | — | CN | claimed |
| CN-107925098-A | Fuel cell photocurable, fuel cell and encapsulating method | 三键有限公司 | 2018-04-17 | — | — | CN | claimed |
| CN-106800619-A | A kind of polymethyl methacrylate and preparation method thereof | 万华化学集团股份有限公司 | 2017-06-06 | — | — | CN | claimed |
| CN-103178213-B | Organic light-emitting display device and manufacture method thereof | LG DISPLAY CO., LTD. (KR) | 2015-11-18 | — | — | CN | claimed |
| CN-102395925-B | Acid-sensitive, developer-soluble bottom anti-reflective coatings | BREWER SCIENCE INC | 2015-06-03 | — | — | CN | claimed |
| CN-102070744-B | Binder resin for resist ink and resist ink using the same | DNP FINE CHEMICALS CO LTD | 2014-12-17 | — | — | CN | claimed |
| US-20100104981-A1 | COLORED DISPERSION, PHOTORESIST COMPOSITION AND BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-29 | — | — | US | claimed |
| WO-2008078953-A1 | BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME | LG CHEM, LTD. (KR) | 2008-07-03 | — | — | WO | claimed |
| US-6617086-B2 | Providing on substrate a layer of a negative photoresist comprising a polymer having methacrylate recurring groups; imagewise exposing layer to irradiation; developing photoresist by removing portions of layer not exposed | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2003-09-09 | — | — | US | claimed |
| US-20020123010-A1 | Forming a pattern of a negative photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2002-09-05 | — | — | US | claimed |
| EP-0869998-B1 | RADIATION-HARDENABLE COATINGS | BASF AG (DE) | 2002-05-08 | — | — | EP | claimed |
| US-6262222-B1 | STABILITY; FOR MICROLITHOGRAPHY | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-07-17 | — | — | US | claimed |
| US-6251569-B1 | ACRYLATED ESTER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-06-26 | — | — | US | claimed |
| EP-0869998-A1 | RADIATION-HARDENABLE COATINGS | BASF AKTIENGESELLSCHAFT (DE) | 1998-10-14 | — | — | EP | claimed |
| WO-1997025385-A1 | RADIATION-HARDENABLE COATINGS | BASF AKTIENGESELLSCHAFT (DE) | 1997-07-17 | — | — | WO | claimed |
| EP-0164675-A2 | Lift-off process | International Business Machines Corporation (US) | 1985-12-18 | — | — | EP | claimed |