⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14950254 | 0.73 | ALOX15 (0.33) | — | |
| SCHEMBL11413582 | 0.73 | — | — | |
| SCHEMBL3390851 | 0.67 | — | — | |
| SCHEMBL9972347 | 0.67 | — | — | |
| Bromide SCHEMBL2228320 | 0.65 | — | — | |
| SCHEMBL3910388 | 0.65 | — | — | |
| SCHEMBL30870366 | 0.65 | — | — | |
| SCHEMBL18872642 | 0.64 | — | — | |
| SCHEMBL23852715 | 0.58 | ALDH1A1 (0.33) | — | |
| SCHEMBL24454854 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025040878-A1 | COMPUTER IMPLEMENTED METHOD | BICYCLETX LIMITED (GB) | 2025-02-27 | — | — | WO | disclosed |
| EP-0672953-B1 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | TOPPAN PRINTING CO LTD (JP) | 2003-01-15 | — | — | EP | disclosed |
| US-6045953-A | COMPRISES A SUBSTRATE, A PHOTOSENSITIVE LAYER FORMED ON THE SUBSTRATE BY COATING A PHOTOSENSITIVE SOLUTION CONTAINING AN ALICYCLIC, SOLVENT SOLUBLE, CATIONIC POLYMERIZABLE EPOXY RESIN AND AN ACRYLATE POLYMER | TOPPAN PRINTING CO., LTD. (JP) | 2000-04-04 | — | — | US | disclosed |
| EP-0697631-B1 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | TOPPAN PRINTING CO LTD (JP) | 1998-06-10 | — | — | EP | disclosed |
| US-5698345-A | CATIONIC POLYMERIZATION OF THERMOSETTING EPOXY OLIGOMER | TOPPAN PRINTING CO., LTD. (JP) | 1997-12-16 | — | — | US | disclosed |
| EP-0697631-A1 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | Toppan Printing Co., Ltd. (JP) | 1996-02-21 | — | — | EP | disclosed |
| EP-0672953-A2 | Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium | Toppan Printing Co., Ltd. (JP) | 1995-09-20 | — | — | EP | disclosed |
| EP-0412851-B1 | Photosensitive member and multi-color image forming method | CANON KK (JP) | 1995-06-14 | — | — | EP | disclosed |
| US-5021321-A | Photothermography; antifogging agents; contrast; lamination of matrix of silver salts and reducing agent and dispersed particles of dye, polymer precursor and photoinitiator | CANON KABUSHIKI KAISHA (JP) | 1991-06-04 | — | — | US | disclosed |