SCHEMBL701986

SCHEMBL701986

CCCCOc1ccc2ccc(C3CCCS3)cc2c1

nearest known ligand 0.48

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAOA P21397 3/20 0.48
MAOB P27338 3/20 0.48
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA3 P07451 1/20 0.40
CA4 P22748 1/20 0.40
CA6 P23280 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
CA5B Q9Y2D0 1/20 0.40
BCHE P06276 1/20 0.39
HRH3 Q9Y5N1 5/20 0.38
CRBN Q96SW2 1/20 0.37
DRD3 P35462 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27639854 0.97 MAOA (0.50) MAOAMAOBCA12CA1CA2
Methane SCHEMBL28755004 0.96 MAOA (0.49) MAOAMAOBCA12CA1CA2
SCHEMBL700280 0.95 MAOA (0.48) MAOAMAOBCA12CA1CA2
SCHEMBL27639881 0.95 MAOA (0.48) MAOAMAOBCA12CA1CA2
SCHEMBL27639895 0.94 MAOA (0.47) MAOAMAOBCA12CA1CA2
SCHEMBL703410 0.90 MAOA (0.46) MAOAMAOBCA12CA1CA4
Fluoride SCHEMBL27659999 0.84 MAOA (0.62) MAOAMAOBCRBN
SCHEMBL702892 0.82 CYP1A2 (0.43) MAOA
SCHEMBL27621080 0.79 MAOA (0.44) MAOA
SCHEMBL27639935 0.79 SLC6A2 (0.45) MAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2325694-B1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR CORP (JP) 2017-11-08 EP disclosed
US-20120164586-A1 PATERN FORMING METHOD JSR CORPORATION (JP) 2012-06-28 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20110262865-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER JSR CORPORATION (JP) 2011-10-27 US disclosed
US-20110212401-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR CORPORATION (JP) 2011-09-01 US disclosed
EP-2325694-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD JSR Corporation (JP) 2011-05-25 EP disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100203452-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed