Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAOA | P21397 | 4/20 | 0.46 |
| ▸ | MAOB | P27338 | 4/20 | 0.46 |
| ▸ | ABL1 | P00519 | 1/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA4 | P22748 | 1/20 | 0.38 |
| ▸ | CA6 | P23280 | 1/20 | 0.38 |
| ▸ | CA5A | P35218 | 1/20 | 0.38 |
| ▸ | CA7 | P43166 | 1/20 | 0.38 |
| ▸ | CA9 | Q16790 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.38 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.35 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.35 |
| ▸ | CYP11B1 | P15538 | 2/20 | 0.35 |
| ▸ | CYP11B2 | P19099 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL700280 | 0.90 | MAOA (0.48) | MAOAMAOBCYP1A2CA12CA1 | |
| SCHEMBL701986 | 0.90 | MAOA (0.48) | MAOAMAOBCA12CA1CA4 | |
| SCHEMBL27639854 | 0.86 | MAOA (0.50) | MAOAMAOBCA12CA1CA4 | |
| Methane SCHEMBL28755004 | 0.85 | MAOA (0.49) | MAOAMAOBCA12CA1CA4 | |
| SCHEMBL702892 | 0.85 | CYP1A2 (0.43) | MAOACYP1A2CYP11B2MAPK1TSHR | |
| SCHEMBL27639881 | 0.84 | MAOA (0.48) | MAOAMAOBCA12CA1CA4 | |
| SCHEMBL27639895 | 0.83 | MAOA (0.47) | MAOAMAOBCA12CA1CA4 | |
| SCHEMBL27621080 | 0.81 | MAOA (0.44) | MAOACYP1A2MAPK1KDM4ETSHR | |
| SCHEMBL27639935 | 0.81 | SLC6A2 (0.45) | MAOAMAOBSLC6A2SLC6A4HTR3A | |
| SCHEMBL27621168 | 0.80 | PARP10 (0.44) | MAOAMAOBSLC6A2SLC6A4HTR3A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-20120164586-A1 | PATERN FORMING METHOD | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110262865-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-10-27 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| EP-2325694-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203452-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |