SCHEMBL702080

SCHEMBL702080

CCCOc1cccc([SiH2]C[SiH2]c2cccc(OCCC)c2OCCC)c1OCCC

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CHRM2 P08172 2/20 0.45
▸ LMNA P02545 1/20 0.45
▸ CHRM1 P11229 1/20 0.45
▸ ALOX15 P16050 1/20 0.45
▸ TSHR P16473 1/20 0.45
▸ ACHE P22303 1/20 0.45
▸ KCNH2 Q12809 1/20 0.45
▸ HIF1A Q16665 1/20 0.45
▸ MCHR1 Q99705 1/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ CYP2A6 P11509 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ CYP1A2 P05177 1/20 0.36
▸ CYP2C9 P11712 1/20 0.36
▸ CYP2C19 P33261 1/20 0.36
▸ HTR1A P08908 1/20 0.35
▸ ADRA1D P25100 1/20 0.35
▸ ADRA1A P35348 1/20 0.35
▸ ADRA1B P35368 1/20 0.35
▸ GRM5 P41594 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706158 0.92 CYP1A2 (0.46) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL705447 0.90 CHRM2 (0.45) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL706700 0.87 CHRM2 (0.42) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL702212 0.87 CHRM2 (0.42) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL646941 0.82 ALDH1A1 (0.41) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL706145 0.81 CYP1A2 (0.46) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL706125 0.81 CHRM2 (0.47) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL8557526 0.81 LMNA (0.62) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL707498 0.80 CYP1A2 (0.45) CHRM2LMNACHRM1ALOX15TSHR
SCHEMBL710736 0.80 CYP1A2 (0.45) CHRM2LMNACHRM1ALOX15TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 — — US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 — — US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 — — US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 — — US disclosed
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