SCHEMBL706145

SCHEMBL706145

CCCCOc1cccc([SiH2]CC[SiH2]c2cccc(OCCCC)c2OCCCC)c1OCCCC

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP1A2 P05177 2/20 0.46
▸ CYP2C9 P11712 2/20 0.46
▸ CYP2C19 P33261 2/20 0.46
▸ CHRM2 P08172 2/20 0.44
▸ LMNA P02545 2/20 0.44
▸ HIF1A Q16665 2/20 0.44
▸ CHRM1 P11229 1/20 0.44
▸ ALOX15 P16050 1/20 0.44
▸ TSHR P16473 1/20 0.44
▸ ACHE P22303 1/20 0.44
▸ KCNH2 Q12809 1/20 0.44
▸ SMN1; SMN2 Q16637 1/20 0.42
▸ MCHR1 Q99705 3/20 0.41
▸ CYP19A1 P11511 1/20 0.40
▸ HTR1B P28222 1/20 0.37
▸ KDM4E B2RXH2 1/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ MAPT P10636 1/20 0.37
▸ NPSR1 Q6W5P4 1/20 0.37
▸ PTGES O14684 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL710736 0.95 CYP1A2 (0.45) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL707498 0.95 CYP1A2 (0.45) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL705447 0.92 CHRM2 (0.45) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL706158 0.90 CYP1A2 (0.46) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL702212 0.89 CHRM2 (0.42) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL706700 0.89 CHRM2 (0.42) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL702281 0.82 CHRM2 (0.46) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL1238407 0.82 LMNA (0.60) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL702080 0.81 CHRM2 (0.45) CYP1A2CYP2C9CYP2C19CHRM2LMNA
SCHEMBL707161 0.81 ALDH1A1 (0.41) CYP1A2CYP2C19CHRM2LMNAHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 — — US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 — — US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 — — US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 — — US disclosed
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