Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | CYP2A6 | P11509 | 4/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 8/20 | 0.42 |
| ▸ | HPGD | P15428 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.42 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.39 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.39 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.39 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.39 |
| ▸ | THRB | P10828 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.38 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.38 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.37 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.37 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31381445 | 1.00 | ALDH1A1 (0.48) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 | |
| SCHEMBL30262230 | 0.91 | ALDH1A1 (0.41) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 | |
| Perchlorate SCHEMBL11658978 | 0.91 | ALDH1A1 (0.41) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 | |
| SCHEMBL10022953 | 0.85 | ALDH1A1 (0.48) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 | |
| SCHEMBL1145354 | 0.81 | ALDH1A1 (0.44) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 | |
| SCHEMBL8278659 | 0.81 | ALDH1A1 (0.44) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31168285 | 0.80 | GPR3 (0.40) | CYP1A2KEAP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL645454 | 0.80 | GPR3 (0.40) | CYP1A2KEAP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1077274 | 0.80 | CYP1A2 (0.37) | ALDH1A1HSD17B10CYP1A2KEAP1NR4A1 | |
| SCHEMBL245440 | 0.79 | ALDH1A1 (0.50) | ALDH1A1CYP2A6HSD17B10TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250147418-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR CORPORATION (JP) | 2025-05-08 | — | — | US | disclosed |
| WO-2023157801-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED SHAPED ARTICLE | JSR株式会社 | 2023-08-24 | — | — | WO | disclosed |
| US-20230205082-A9 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2023-06-29 | — | — | US | disclosed |
| US-20210063871-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| US-10423083-B2 | Cleaning method of immersion liquid, immersion liquid cleaning composition, and substrate | JSR CORPORATION (JP) | 2019-09-24 | — | — | US | disclosed |
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| CN-105917275-B | Liquid photoreactive composition and method of fabricating a structure | 3M创新有限公司 | 2018-01-16 | — | — | CN | disclosed |
| EP-2325695-B1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| EP-2131423-B1 | NEGATIVE ELECTRODE BASE MEMBER | TOKYO OHKA KOGYO CO LTD (JP) | 2017-11-15 | — | — | EP | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| CN-1291301-A | Positive active photodielectric composition | EASORA LAMINATED SYSTEM CO (US) | 2001-04-11 | — | — | CN | disclosed |
| US-6190834-B1 | FIRST RESIN BEING AN EPOXY RESIN, AND A SECOND EPOXY RESIN HAVING AN N-SUBSTITUTED CARBAMIC ACID ESTER GROUP AND A RADICAL POLYMERIC UNSATURATED BOND IN ITS SIDE CHAIN | HITACHI, LTD. (JP) | 2001-02-20 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| US-6168898-B1 | A POSITIVE ACTING, PHOTOIMAGEABLE COMPOSITION HAVING, A PHOTOACID GENERATOR CAPABLE OF GENERATING AN ACID UPON EXPOSURE TO ACTINIC RADIATION, A STYRENE-MALEIC ANHYDRIDE COPOLYMER, AN EPXOY, AND A CURING CATALYST | ISOLA LAMINATE SYSTEMS CORP. | 2001-01-02 | — | — | US | disclosed |
| EP-1062545-A1 | POSITIVE ACTING PHOTODIELECTRIC COMPOSITION | Isola Laminate Systems Corporation (US) | 2000-12-27 | — | — | EP | disclosed |
| EP-0976307-A1 | POSITIVE WORKING PHOTODEFINABLE RESIN COATED METAL FOR MASS PRODUCTION OF MICROVIAS IN MULTILAYER PRINTED WIRING BOARDS | AlliedSignal Inc. (US) | 2000-02-02 | — | — | EP | disclosed |
| EP-0976308-A1 | FABRICATION OF HIGH DENSITY MULTILAYER INTERCONNECT PRINTED CIRCUIT BOARDS | AlliedSignal Inc. (US) | 2000-02-02 | — | — | EP | disclosed |
| WO-1999041642-A1 | POSITIVE ACTING PHOTODIELECTRIC COMPOSITION | ISOLA LAMINATE SYSTEMS CORPORATION (US) | 1999-08-19 | — | — | WO | disclosed |
| WO-1998047333-A1 | FABRICATION OF HIGH DENSITY MULTILAYER INTERCONNECT PRINTED CIRCUIT BOARDS | ALLIEDSIGNAL INC. (US) | 1998-10-22 | — | — | WO | disclosed |
| WO-1998047332-A1 | POSITIVE WORKING PHOTODEFINABLE RESIN COATED METAL FOR MASS PRODUCTION OF MICROVIAS IN MULTILAYER PRINTED WIRING BOARDS | ALLIEDSIGNAL INC. (US) | 1998-10-22 | — | — | WO | disclosed |