⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL715641 | 0.91 | THRB (0.33) | — | |
| SCHEMBL12486008 | 0.87 | THRB (0.38) | — | |
| SCHEMBL716383 | 0.87 | THRB (0.38) | — | |
| SCHEMBL14776639 | 0.87 | THRB (0.38) | — | |
| SCHEMBL14777444 | 0.87 | THRB (0.38) | — | |
| SCHEMBL6744300 | 0.87 | THRB (0.38) | — | |
| SCHEMBL716235 | 0.87 | THRB (0.38) | — | |
| SCHEMBL12485754 | 0.87 | THRB (0.38) | — | |
| SCHEMBL714644 | 0.87 | THRB (0.38) | — | |
| SCHEMBL12487178 | 0.87 | THRB (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 433 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109563243-B | Fluorine atom-containing polymer and use thereof | 日产化学株式会社 | 2022-07-08 | — | — | CN | claimed |
| EP-3168250-B1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | NISSAN CHEMICAL CORP (JP) | 2020-02-26 | — | — | EP | claimed |
| US-10199578-B2 | Fluorine-atom-containing polymer and use thereof | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-02-05 | — | — | US | claimed |
| US-20170200897-A1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-13 | — | — | US | claimed |
| EP-3168250-A1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | Nissan Chemical Industries, Ltd. (JP) | 2017-05-17 | — | — | EP | claimed |
| EP-3124466-A1 | TRIARYLAMINE DERIVATIVE AND USE OF SAME | Nissan Chemical Industries, Ltd. (JP) | 2017-02-01 | — | — | EP | claimed |
| US-12046269-B2 | Two bit memory device and method for operating the two-bit memory device and electronic component | MERCK PATENT GMBH (DE) | 2024-07-23 | — | — | US | disclosed |
| US-20240231226-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-11 | — | — | US | disclosed |
| US-12035546-B2 | Method for producing an electronic component which includes a self-assembled monolayer | MERCK PATENT GMBH (DE) | 2024-07-09 | — | — | US | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210823-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-18 | — | — | US | disclosed |
| EP-1043297-A1 | PROCESS FOR THE PREPARATION OF COMPOUNDS HAVING -CH2-CHF- GROUPS | Nippon Zeon Co., Ltd. (JP) | 2000-10-11 | — | — | EP | disclosed |
| WO-2000056787-A1 | SUPPORTED CATALYSTS AND OLEFIN POLYMERIZATION PROCESSES UTILIZING SAME | CRYOVAC, INC. (US) | 2000-09-28 | — | — | WO | disclosed |
| WO-2000056786-A1 | SUPPORTED CATALYSTS AND OLEFIN POLYMERIZATION PROCESSES UTILIZING SAME | CRYOVAC, INC. (US) | 2000-09-28 | — | — | WO | disclosed |
| US-5847243-A | Process for producing fluorinated alkene and fluorinated alkane | JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5756650-A | COMPOSITION COMPRISING POLYAMIC ACID, CURE ACCELERATOR SELECTED FROM GROUP CONSISTING OF NITROGEN-CONTAINING HETEROCYCLIC COMPOUND, AMINO ACID COMPOUND, AROMATIC COMPOUND HAVING TWO OR MORE HYDROXYL GROUPS | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0768289-A1 | PROCESS FOR PRODUCING FLUORINATED ALKENE DERIVATIVE AND FLUORINATED ALKANE DERIVATIVE | JAPAN as represented by DIRECTOR GENERAL, AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1997-04-16 | — | — | EP | disclosed |
| US-3978079-A | DIPHTHALIMIDO, DISUCCINIMIDO AND DIMALEIMIDO OXALATES | AMERICAN CYANAMID COMPANY (US) | 1976-08-31 | — | — | US | disclosed |