SCHEMBL715641

SCHEMBL715641

F[C](F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[C](F)F

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12487178 0.96 THRB (0.38) THRB
SCHEMBL12486008 0.96 THRB (0.38) THRB
SCHEMBL14776639 0.96 THRB (0.38) THRB
SCHEMBL714644 0.96 THRB (0.38) THRB
SCHEMBL716235 0.96 THRB (0.38) THRB
SCHEMBL716383 0.96 THRB (0.38) THRB
SCHEMBL6744300 0.96 THRB (0.38) THRB
SCHEMBL12485754 0.96 THRB (0.38) THRB
SCHEMBL14777444 0.96 THRB (0.38) THRB
SCHEMBL702848 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 344 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109563243-B Fluorine atom-containing polymer and use thereof 日产化学株式会社 2022-07-08 CN claimed
EP-3168250-B1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF NISSAN CHEMICAL CORP (JP) 2020-02-26 EP claimed
US-10199578-B2 Fluorine-atom-containing polymer and use thereof NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-02-05 US claimed
US-20170200897-A1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-07-13 US claimed
EP-3168250-A1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF Nissan Chemical Industries, Ltd. (JP) 2017-05-17 EP claimed
EP-3124466-A1 TRIARYLAMINE DERIVATIVE AND USE OF SAME Nissan Chemical Industries, Ltd. (JP) 2017-02-01 EP claimed
US-12046269-B2 Two bit memory device and method for operating the two-bit memory device and electronic component MERCK PATENT GMBH (DE) 2024-07-23 US disclosed
US-20240231226-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-11 US disclosed
US-12035546-B2 Method for producing an electronic component which includes a self-assembled monolayer MERCK PATENT GMBH (DE) 2024-07-09 US disclosed
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
WO-2024143067-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PARTITION WALL, ORGANIC ELECTROLUMINESCENT ELEMENT, COLOR FILTER, IMAGE DISPLAY APPARATUS, AND CURED PRODUCT FORMING METHOD 三菱ケミカル株式会社 2024-07-04 WO disclosed
US-20240209148-A1 RESIN COMPOSITION FOR LOW-DIELECTRIC MATERIAL, FILM FOR MULTILAYER SUBSTRATE, MULTILAYER SUBSTRATE, METHOD FOR PRODUCING RESIN COMPOSITION FOR LOW-DIELECTRIC MATERIAL, METHOD FOR PRODUCING FILM FOR MULTILAYER SUBSTRATE, AND METHOD FOR PRODUCING MULTILAYER SUBSTRATE NATIONAL UNIVERSITY CORPORATION, IWATE UNIVERSITY (JP) 2024-06-27 US disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
EP-0811604-A1 Fluorine-containing azo compounds WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-12-10 EP disclosed
EP-0811605-A1 Fluorine-containing macroazo compound WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-12-10 EP disclosed
EP-0768289-A1 PROCESS FOR PRODUCING FLUORINATED ALKENE DERIVATIVE AND FLUORINATED ALKANE DERIVATIVE JAPAN as represented by DIRECTOR GENERAL, AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1997-04-16 EP disclosed
US-5204434-A Grignard condensation of dichlorosilane with dibromo compound KALI-CHEMIE AG (DE) 1993-04-20 US disclosed
EP-0247476-B1 HYDROXYPHENYL URETHANES, PROCESS FOR THEIR MANUFACTURE, THEIR USES AND CHLOROFORMATES COMPRISING HYDROXYPHENYL URETHANE GROUPS BAYER AG (DE) 1990-12-27 EP disclosed
EP-0247483-A2 Process for the preparation of hydroxyphenyl urethanes BAYER AG (DE) 1987-12-02 EP disclosed
EP-0247476-A1 Hydroxyphenyl urethanes, process for their manufacture, their uses and chloroformates comprising hydroxyphenyl urethane groups BAYER AG (DE) 1987-12-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 THRB 1323/4885
US-10199578-B2 Fluorine-atom-containing polymer and use thereof METTL3, AFF4, AFF1 THRB 1247/4885
US-20240219830-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-0, HCN3, RER1 THRB 1597/4885
US-20170200897-A1 FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF METTL3, AFF4, AFF1 THRB 1247/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.