Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12486008 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL12485754 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL12487178 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL14777444 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL716235 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL14776639 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL716383 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL6744300 | 1.00 | THRB (0.38) | THRB | |
| SCHEMBL715641 | 0.96 | THRB (0.33) | THRB | |
| SCHEMBL64969 | 0.89 | THRB (0.52) | THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 274 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12046269-B2 | Two bit memory device and method for operating the two-bit memory device and electronic component | MERCK PATENT GMBH (DE) | 2024-07-23 | — | — | US | disclosed |
| US-20240231226-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-11 | — | — | US | disclosed |
| US-12035546-B2 | Method for producing an electronic component which includes a self-assembled monolayer | MERCK PATENT GMBH (DE) | 2024-07-09 | — | — | US | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210823-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-18 | — | — | US | disclosed |
| CN-118159545-A | Electronic switching device | 默克专利有限公司 | 2024-06-07 | — | — | CN | disclosed |
| CN-113840827-B | Adamantane compound | 默克专利有限公司 | 2024-05-14 | — | — | CN | disclosed |
| US-20240142872-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-05-02 | — | — | US | disclosed |
| US-7507450-B2 | Varnish for forming liquid crystal alignment layer and liquid crystal display element using the same | CHISSO CORPORATION (JP) | 2009-03-24 | — | — | US | disclosed |
| US-7417100-B2 | Transparent fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-08-26 | — | — | US | disclosed |
| US-20060204680-A1 | Varnish for forming liquid crystal alignment layer and liquid crystal display element using the same | JNC CORPORATION (JP) | 2006-09-14 | — | — | US | disclosed |
| US-7060771-B2 | Transparent fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-06-13 | — | — | US | disclosed |
| US-20060063902-A1 | Transparent fluorine-containing copolymer | CENTRAL GLASS CO., LTD. (JP) | 2006-03-23 | — | — | US | disclosed |
| EP-1043297-B1 | PROCESS FOR THE PREPARATION OF COMPOUNDS HAVING -CH2-CHF- GROUPS | NIPPON ZEON CO (JP) | 2005-06-29 | — | — | EP | disclosed |
| US-20030236369-A1 | Transparent fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2003-12-25 | — | — | US | disclosed |
| US-6395700-B1 | CATALYTIC HYDROGENATION | NIPPON ZEON CO., LTD. (JP) | 2002-05-28 | — | — | US | disclosed |
| WO-2000073584-A1 | DEVICE AND METHOD FOR MASS DEACIDIFICATION, ELIMINATION OF FREE ACIDITY AND DISINFESTATION OF CELLULOSIC MATERIAL | UNIVERSIDAD POLITECNICA DE CATALUÑA (ES) | 2000-12-07 | — | — | WO | disclosed |
| EP-1043297-A1 | PROCESS FOR THE PREPARATION OF COMPOUNDS HAVING -CH2-CHF- GROUPS | Nippon Zeon Co., Ltd. (JP) | 2000-10-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, FGFR1, NHERF1 | THRB 1445/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | THRB 1323/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | THRB 1597/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.