Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15228165 | 0.82 | — | — | |
| SCHEMBL544336 | 0.81 | CA1 (0.41) | CA1CA9 | |
| SCHEMBL16308846 | 0.76 | CA1 (0.46) | CA1CA9 | |
| SCHEMBL9099357 | 0.75 | — | — | |
| SCHEMBL28068367 | 0.75 | ALDH1A1 (0.32) | — | |
| SCHEMBL700302 | 0.73 | PTPN1 (0.30) | — | |
| SCHEMBL29122247 | 0.71 | HPGD (0.33) | — | |
| SCHEMBL2365209 | 0.70 | ALDH1A1 (0.36) | CA1CA9 | |
| SCHEMBL28342199 | 0.70 | SLC6A3 (0.35) | — | |
| SCHEMBL701380 | 0.70 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024018725-A1 | SEQUENCE ANALYZING METHOD, SEQUENCE ANALYZING DEVICE, POLYMERIZATION CONDITION PROPOSING DEVICE, AND AUTOMATIC SYNTHESIZING DEVICE | 国立研究開発法人物質・材料研究機構 | 2024-01-25 | — | — | WO | disclosed |
| US-8802348-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8182977-B2 | Polymer and positive-tone radiation-sensitive resin composition | JSR CORPORATION (JP) | 2012-05-22 | — | — | US | disclosed |
| US-8124314-B2 | Radiation-sensitive composition | JSR CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20100239981-A1 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100221664-A1 | RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2010-09-02 | — | — | US | disclosed |
| US-20100203447-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-08-12 | — | — | US | disclosed |