SCHEMBL544336

SCHEMBL544336

CC(=CC1CCC(=O)O1)C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.41
CA9 Q16790 1/20 0.41
ALDH1A1 P00352 2/20 0.39
GABRA1 P14867 1/20 0.39
TSHR P16473 1/20 0.39
GABRG2 P18507 1/20 0.39
RXRA P19793 1/20 0.39
GABRB3 P28472 1/20 0.39
RXRB P28702 1/20 0.39
GABRB2 P47870 1/20 0.39
RXRG P48443 1/20 0.39
TDP1 Q9NUW8 1/20 0.34
CYP1A2 P05177 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2365209 0.88 ALDH1A1 (0.36) CA1CA9ALDH1A1GABRA1TSHR
Phosphoric Acid SCHEMBL17507878 0.82 ALDH1A1 (0.33) CA1CA9ALDH1A1GABRA1TSHR
SCHEMBL703280 0.81 CA1 (0.37) CA1CA9
SCHEMBL16308846 0.80 CA1 (0.46) CA1CA9ALDH1A1TSHRCYP1A2
SCHEMBL19044544 0.76 CA1 (0.36) CA1CA9ALDH1A1CYP1A2
SCHEMBL4431242 0.74 ALDH1A1 (0.33) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL15228165 0.74
SCHEMBL5729458 0.73
SCHEMBL9206399 0.73
SCHEMBL4652897 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2707442-B1 PHOTOPOLYMERIZABLE INKJET INK, INK CARTRIDGE, AND INKJET RECORDING DEVICE RICOH CO LTD (JP) 2017-11-08 EP claimed
US-8696101-B2 Photopolymerizable inkjet black ink, and ink cartridge, inkjet printer and printed material using the ink, and method of preparing the ink RICOH COMPANY, LTD. (JP) 2014-04-15 US claimed
US-20120200648-A1 PHOTOPOLYMERIZABLE INKJET BLACK INK, AND INK CARTRIDGE, INKJET PRINTER AND PRINTED MATERIAL USING THE INK, AND METHOD OF PREPARING THE INK RICOH COMPANY, LTD. (JP) 2012-08-09 US claimed
EP-3067395-B1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER SEIKO EPSON CORP (JP) 2020-10-28 EP disclosed
CN-107210197-B Hybrid topography and chemical pre-patterning for directed self-assembly of block copolymers 国际商业机器公司 2020-06-19 CN disclosed
US-10392522-B2 Ultraviolet curable composition and recorded object SEIKO EPSON CORPORATION (JP) 2019-08-27 US disclosed
CN-107210197-A Hybrid topography and chemical pre-patterning for directed self-assembly of block copolymers 国际商业机器公司 2017-09-26 CN disclosed
EP-3067395-A1 ULTRAVIOLET RADIATION-CURABLE COMPOSITION, AND RECORDED MATTER Seiko Epson Corporation (JP) 2016-09-14 EP disclosed
US-20160257827-A1 ULTRAVIOLET CURABLE COMPOSITION AND RECORDED OBJECT SEIKO EPSON CORPORATION (JP) 2016-09-08 US disclosed
CN-104119477-B Resist polymer and comprise the anti-corrosion agent composition of this polymer 锦湖石油化学株式会社 2016-07-13 CN disclosed
CN-103772341-B New acrylic monomer, polymkeric substance and comprise the anti-corrosion agent composition of this polymkeric substance KOREA KUMHO PHTROCHEMICAL CO., LTD. (KR) 2016-04-13 CN disclosed
US-20110034721-A1 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-02-10 US disclosed
US-20110015431-A1 Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt CENTRAL GLASS COMPANY, LIMITED (JP) 2011-01-20 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
WO-2009019574-A1 PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-02-12 WO disclosed
US-20090042148-A1 Photoresist Composition for Deep UV and Process Thereof AZ ELECTRONIC MATERIALS USA CORP. 2009-02-12 US disclosed
CN-1866129-A Resist material and pattern formation method using the same MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2006-11-22 CN disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
US-6835527-B2 Lithography; forming semiconductors SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-12-28 US disclosed
US-20030039918-A1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-02-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110034721-A1 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same PFAS, DDAH1, STS CA1 386/4885CA9 446/4885ALDH1A1 421/4885
US-20110015431-A1 Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt HAO2, SULT2A1, CYP2F1 CA1 663/4885CA9 385/4885ALDH1A1 28/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.