Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 4/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.42 |
| ▸ | IDO1 | P14902 | 1/20 | 0.41 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | MAOB | P27338 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.39 |
| ▸ | CASP1 | P29466 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.39 |
| ▸ | MAOA | P21397 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15302534 | 0.83 | TP53 (0.43) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL703495 | 0.82 | CALM1 (0.45) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL1538756 | 0.78 | CALM1 (0.41) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL476128 | 0.77 | TP53 (0.48) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL6960735 | 0.77 | TP53 (0.48) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL41196 | 0.75 | CALM1 (0.50) | TP53CALM1TSHRALDH1A1IDO1 | |
| Fluoride SCHEMBL28075257 | 0.74 | TP53 (0.46) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL15302323 | 0.73 | TP53 (0.39) | TP53SIGMAR1 | |
| Hydrochloric Acid SCHEMBL29160220 | 0.73 | CALM1 (0.47) | TP53CALM1TSHRALDH1A1IDO1 | |
| SCHEMBL9422248 | 0.73 | CALM1 (0.47) | TP53CALM1TSHRALDH1A1IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107428891-B | Curable composition | 施敏打硬株式会社 | 2021-04-20 | — | — | CN | disclosed |
| CN-105392845-B | Photocurable composition | 思美定株式会社 | 2020-10-20 | — | — | CN | disclosed |
| EP-3081612-B1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO LTD (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-9718999-B2 | Photocurable composition having adhesive properties | CEMEDINE CO., LTD (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160152783-A1 | PHOTOCURABLE COMPOSITION | CEMEDINE CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| EP-3023462-A1 | PHOTOCURABLE COMPOSITION | Cemedine Co., Ltd. (JP) | 2016-05-25 | — | — | EP | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8124690-B2 | Moisture curable polymer having SiF group, and curable composition containing the same | KANEKA CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090088541-A1 | ALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2009-04-02 | — | — | US | disclosed |
| US-20080161217-A1 | Stripper for Coating Layer | MERCK PATENT GMBH (DE) | 2008-07-03 | — | — | US | disclosed |
| US-7355058-B2 | Haloaluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2008-04-08 | — | — | US | disclosed |
| US-7193100-B2 | Haloaluminoxane compositions, their preparation, and their use in catalysis | ALBEMARLE CORPORATION (US) | 2007-03-20 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| WO-2007005364-A2 | HALOALUMINOXANE COMPOSITIONS | ALBEMARLE CORPORATION (US) | 2007-01-11 | — | — | WO | disclosed |
| US-20060287448-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO-CONN. | 2006-12-21 | — | — | US | disclosed |
| EP-1701963-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2006-09-20 | — | — | EP | disclosed |
| WO-2005066191-A1 | HALOALUMINOXANE COMPOSITIONS, THEIR PREPARATION, AND THEIR USE IN CATALYSIS | ALBEMARLE CORPORATION (US) | 2005-07-21 | — | — | WO | disclosed |
| US-20050143254-A1 | Haloaluminoxane compositions, their preparation, and their use in catalysis | W. R. GRACE & CO.-CONN. | 2005-06-30 | — | — | US | disclosed |