⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704745 | 0.83 | — | — | |
| SCHEMBL15541788 | 0.72 | — | — | |
| SCHEMBL15550898 | 0.72 | — | — | |
| Fluoromethane SCHEMBL14973427 | 0.62 | — | — | |
| SCHEMBL4344284 | 0.62 | — | — | |
| SCHEMBL20455819 | 0.61 | — | — | |
| SCHEMBL7573200 | 0.61 | — | — | |
| SCHEMBL6892 | 0.61 | — | — | |
| SCHEMBL16241385 | 0.58 | — | — | |
| Hydrochloric Acid SCHEMBL2873631 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100320428-A1 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2010-12-23 | — | — | US | claimed |
| EP-2097909-A2 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | Honeywell International Inc. (US) | 2009-09-09 | — | — | EP | claimed |
| WO-2008073790-A2 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2008-06-19 | — | — | WO | claimed |
| US-20080135817-A1 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. | 2008-06-12 | — | — | US | claimed |
| EP-0130908-B1 | HEAT TRANSFER PROCESS WITH A THREE-PHASE MONOVARIANT REACTION | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1987-09-09 | — | — | EP | claimed |
| US-4682476-A | Three-phase heat pump | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1987-07-28 | — | — | US | claimed |
| EP-0130908-A1 | Heat transfer process with a three-phase monovariant reaction | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1985-01-09 | — | — | EP | claimed |
| CN-107428891-B | Curable composition | 施敏打硬株式会社 | 2021-04-20 | — | — | CN | disclosed |
| EP-3081612-B1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO LTD (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-9718999-B2 | Photocurable composition having adhesive properties | CEMEDINE CO., LTD (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160152783-A1 | PHOTOCURABLE COMPOSITION | CEMEDINE CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| WO-2008073790-A2 | GASEOUS DIELECTRICS WITH LOW GLOBAL WARMING POTENTIALS | HONEYWELL INTERNATIONAL INC. (US) | 2008-06-19 | — | — | WO | disclosed |
| US-20080135817-A1 | Gaseous dielectrics with low global warming potentials | HONEYWELL INTERNATIONAL INC. | 2008-06-12 | — | — | US | disclosed |
| US-4873842-A | INTERMITTENT CYCLE OF HEAT STORAGE AND WITHDRAWAL | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1989-10-17 | — | — | US | disclosed |
| EP-0130908-B1 | HEAT TRANSFER PROCESS WITH A THREE-PHASE MONOVARIANT REACTION | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1987-09-09 | — | — | EP | disclosed |
| US-4682476-A | Three-phase heat pump | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1987-07-28 | — | — | US | disclosed |
| EP-0130908-A1 | Heat transfer process with a three-phase monovariant reaction | SOCIETE NATIONALE ELF AQUITAINE (FR) | 1985-01-09 | — | — | EP | disclosed |
| US-4229558-A | HAVING HIGH ISOTACTIC INDEX BY USING A CATALYST PREPARED FROM A MAGNESIUM GRIGNARD REAGENT, TITANIUM HALIDE AN ETHER AND A CARBOXYLIC ESTER COMBINED WITH AN ORGANOALUMINUM COMPOUND | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1980-10-21 | — | — | US | disclosed |