⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703400 | 0.83 | — | — | |
| SCHEMBL15550898 | 0.72 | — | — | |
| SCHEMBL15541788 | 0.72 | — | — | |
| SCHEMBL4344284 | 0.62 | — | — | |
| Fluoromethane SCHEMBL14973427 | 0.62 | — | — | |
| SCHEMBL20455819 | 0.61 | — | — | |
| SCHEMBL6892 | 0.61 | — | — | |
| SCHEMBL7573200 | 0.61 | — | — | |
| SCHEMBL16241385 | 0.58 | — | — | |
| Hydrochloric Acid SCHEMBL2873631 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111530296-A | Polyamide reverse osmosis membrane based on fluorine-containing dichlorosilane and preparation method thereof | 浙江工业大学 | 2020-08-14 | — | — | CN | claimed |
| WO-2024181754-A1 | DIELECTRIC FILM FOR ELECTROWETTING | ㈜쓰리나인 | 2024-09-06 | — | — | WO | disclosed |
| US-12012486-B2 | System and method for a semi-continuous process for producing polysilazanes | A/G INNOVATION PARTNERS, LTD. (US) | 2024-06-18 | — | — | US | disclosed |
| CN-218701769-U | Composite membrane with hydrophobic function for medicine packaging | 常州市华健药用包装材料有限公司 | 2023-03-24 | — | — | CN | disclosed |
| US-20230081862-A1 | Focus Ring Regeneration | TOKYO ELECTRON LIMITED (JP) | 2023-03-16 | — | — | US | disclosed |
| CN-112625243-B | Fluorine-containing modified polysiloxane, and preparation method and application thereof | 山东东岳高分子材料有限公司 | 2022-09-02 | — | — | CN | disclosed |
| CN-112552516-B | Modified polysiloxane containing fluorine ring bodies, preparation method and application thereof | 山东东岳高分子材料有限公司 | 2022-07-01 | — | — | CN | disclosed |
| US-20210317272-A1 | A SYSTEM AND METHOD FOR A SEMI-CONTINUOUS PROCESS FOR PRODUCING POLYSILAZANES | A/G INNOVATION PARTNERS LTD (US) | 2021-10-14 | — | — | US | disclosed |
| US-10995268-B2 | Etching composition effective to selectively wet etch a silicon nitride film | LTCAM CO., LTD. (KR) | 2021-05-04 | — | — | US | disclosed |
| CN-107428891-B | Curable composition | 施敏打硬株式会社 | 2021-04-20 | — | — | CN | disclosed |
| EP-1232162-A4 | NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING | KION CORP (US) | 2003-10-22 | — | — | EP | disclosed |
| US-20030083453-A1 | Thermally stable, moisture curable polysilazanes and polysiloxazanes | KION CORPORATION | 2003-05-01 | — | — | US | disclosed |
| US-6534184-B2 | Coatings/protective coatings having heat and corrosion resistance, and adhesion derived from the polysilazane and superior gloss, durability, waterproofing, oil rellency and release properties derived from the polysiloxane | KION CORPORATION | 2003-03-18 | — | — | US | disclosed |
| WO-2002090108-A2 | THERMALLY STABLE, MOISTURE CURABLE POLYSILAZANES AND POLYSILOXAZANES | KION CORPORATION (US) | 2002-11-14 | — | — | WO | disclosed |
| US-20020165319-A1 | Polysilazane/polysiloxane block copolymers | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) | 2002-11-07 | — | — | US | disclosed |
| WO-2002068535-A1 | POLYSILAZANE/POLYSILOXANE BLOCK COPOLYMERS | KION CORPORATION (US) | 2002-09-06 | — | — | WO | disclosed |
| EP-1232162-A1 | NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING | Kion Corporation (US) | 2002-08-21 | — | — | EP | disclosed |
| WO-2001036427-A9 | NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING | KION CORP (US) | 2002-08-15 | — | — | WO | disclosed |
| US-6329487-B1 | CAN BE PYROLYZED TO YIELD CERAMIC MATERIALS, SUCH AS SILICON CARBIDE AND SILICON NITRIDE | KION CORPORATION | 2001-12-11 | — | — | US | disclosed |
| WO-2001036427-A1 | NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING | KION CORPORATION (US) | 2001-05-25 | — | — | WO | disclosed |