Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | PCSK9 | Q8NBP7 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 2/20 | 0.32 |
| ▸ | RAB9A | P51151 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.32 |
| ▸ | MPO | P05164 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | NAAA | Q02083 | 1/20 | 0.32 |
| ▸ | SLC9A1 | P19634 | 1/20 | 0.32 |
| ▸ | AR | P10275 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19470825 | 0.94 | LTA4H (0.37) | LTA4HNPC1RAB9ASMN1; SMN2LMNA | |
| SCHEMBL20483789 | 0.93 | KCNH2 (0.39) | LTA4HNPC1RAB9ASMN1; SMN2ABCB1 | |
| SCHEMBL28164442 | 0.93 | KCNH2 (0.39) | LTA4HNPC1RAB9ASMN1; SMN2ABCB1 | |
| SCHEMBL19470829 | 0.93 | KCNH2 (0.39) | LTA4HNPC1RAB9ASMN1; SMN2ABCB1 | |
| SCHEMBL19470865 | 0.93 | KCNH2 (0.39) | LTA4HNPC1RAB9ASMN1; SMN2ABCB1 | |
| SCHEMBL19470880 | 0.93 | KCNH2 (0.39) | LTA4HNPC1RAB9ASMN1; SMN2ABCB1 | |
| SCHEMBL19470850 | 0.93 | KCNH2 (0.39) | LTA4HNPC1RAB9ASMN1; SMN2ABCB1 | |
| SCHEMBL707984 | 0.92 | LTA4H (0.32) | LTA4HMAPT | |
| SCHEMBL647736 | 0.92 | TSHR (0.33) | LTA4HTSHRMAPT | |
| SCHEMBL703527 | 0.90 | AR (0.38) | AR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1040015-C | Antifogging abrasion resistant coating composition and synthetic resin article coated therewith | LUCKY LTD (KR) | 1998-09-30 | — | — | CN | claimed |
| CN-1098429-A | Antifogging abrasion resistant coating composition and with the synthetic resin article of its coating | LUCKY LTD (KR) | 1995-02-08 | — | — | CN | claimed |
| CN-107075255-B | Encapsulating material composition for LED | 日产化学工业株式会社 | 2020-05-22 | — | — | CN | disclosed |
| CN-109642009-A | SILANE-FUNCTIONAL POLYMERIC POLYURETHANES | 科思创德国股份有限公司 | 2019-04-16 | — | — | CN | disclosed |
| US-10066059-B2 | Sealing material composition for LED | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| CN-107075255-A | LED encapsulant compositions | 日产化学工业株式会社 | 2017-08-18 | — | — | CN | disclosed |
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| CN-102947393-B | Typical metal containing polysiloxane composition, process for production of same, and uses thereof | TOSOH CORP | 2015-03-11 | — | — | CN | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| CN-1803805-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1793151-A | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORP (JP) | 2006-06-28 | — | — | CN | disclosed |
| CN-1437228-A | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2003-08-20 | — | — | CN | disclosed |
| CN-1040015-C | Antifogging abrasion resistant coating composition and synthetic resin article coated therewith | LUCKY LTD (KR) | 1998-09-30 | — | — | CN | disclosed |
| CN-1098429-A | Antifogging abrasion resistant coating composition and with the synthetic resin article of its coating | LUCKY LTD (KR) | 1995-02-08 | — | — | CN | disclosed |
| EP-0310320-B1 | Curable composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1994-12-28 | — | — | EP | disclosed |
| US-4923948-A | Curable composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1990-05-08 | — | — | US | disclosed |
| EP-0310320-A2 | Curable composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-04-05 | — | — | EP | disclosed |