SCHEMBL7034832

SCHEMBL7034832

C=Cc1ccc(C(Cl)C=C)cc1

nearest known ligand 0.52

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.52
TSHR P16473 1/20 0.40
TDP1 Q9NUW8 1/20 0.35
HDAC8 Q9BY41 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL3265479 0.85 ALDH1A1 (0.58) ALDH1A1TSHRTDP1HDAC8
Styrene SCHEMBL2779375 0.81 ALDH1A1 (0.54) ALDH1A1TSHRTDP1
SCHEMBL1264527 0.80 ALDH1A1 (0.58) ALDH1A1TSHRTDP1HDAC8
Chloroform SCHEMBL28057528 0.79 ALDH1A1 (0.73) ALDH1A1TSHRTDP1HDAC8
SCHEMBL11082624 0.78 ALDH1A1 (0.41) ALDH1A1TSHR
Styrene SCHEMBL29377241 0.78 ALDH1A1 (0.50) ALDH1A1TSHR
Styrene SCHEMBL8792149 0.78 ALDH1A1 (0.50) ALDH1A1TSHR
SCHEMBL22820010 0.78 ALDH1A1 (0.55) ALDH1A1TSHRTDP1HDAC8
SCHEMBL16895017 0.77 ALDH1A1 (0.39) ALDH1A1TSHR
SCHEMBL810409 0.76 ALDH1A1 (0.52) ALDH1A1TSHRTDP1HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115784862-A Method for preparing 3-hydroxypropionaldehyde by acrolein hydration 万华化学集团股份有限公司 2023-03-14 CN disclosed
US-6767687-B1 CAN FORM FINER PATTERNS ON A SUBSTRATE IN A MICRO-LITHOGRAPHY PROCESS SUITABLE FOR MICRO-PROCESSING OF SEMICONDUCTORS DONGJIN SEMICHEM CO., LTD. (KR) 2004-07-27 US disclosed
US-20030181629-A1 Chemically amplified resist and a resist composition DONGJIN SEMICHEM CO., LTD. (KR) 2003-09-25 US disclosed
WO-2001018603-A2 POLYMER FOR CHEMICALLY AMPLIFIED RESIST AND A RESIST COMPOSITION USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2001-03-15 WO disclosed