⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL27534295 | 0.97 | — | — | |
| SCHEMBL707439 | 0.76 | — | — | |
| SCHEMBL704931 | 0.76 | — | — | |
| SCHEMBL28692974 | 0.75 | — | — | |
| SCHEMBL707850 | 0.75 | — | — | |
| SCHEMBL15312341 | 0.73 | — | — | |
| SCHEMBL28898368 | 0.73 | — | — | |
| SCHEMBL704129 | 0.71 | — | — | |
| SCHEMBL9244624 | 0.71 | — | — | |
| SCHEMBL1225117 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102653638-B | Thermosetting dip-coating composition | DAEJOO NANO SOLAR (KR) | 2015-11-25 | — | — | CN | claimed |
| CN-102653638-A | Thermosetting dip-coating composition | DAEJOO NANO SOLAR | 2012-09-05 | — | — | CN | claimed |
| CN-109423309-B | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display assembly | 奇美实业股份有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-113330078-B | Release layer and product containing release layer | 3M创新有限公司 | 2022-12-02 | — | — | CN | disclosed |
| WO-2022230944-A1 | PLANARIZING FILM MANUFACTURING METHOD, PLANARIZING FILM MATERIAL, AND PLANARIZING FILM | 東ソー株式会社 | 2022-11-03 | — | — | WO | disclosed |
| CN-110317457-B | Polysilazane composition, coated substrate, and multilayer structure | 信越化学工业株式会社 | 2022-09-16 | — | — | CN | disclosed |
| CN-113330078-A | Release layer and product containing release layer | 3M创新有限公司 | 2021-08-31 | — | — | CN | disclosed |
| US-10759119-B2 | Three dimensional mold object manufacturing apparatus, method for manufacturing three dimensional mold object, and three dimensional mold object | SEIKO EPSON CORPORATION (JP) | 2020-09-01 | — | — | US | disclosed |
| US-10279603-B2 | Production method of recording material, and recording material | SEIKO EPSON CORPORATION (JP) | 2019-05-07 | — | — | US | disclosed |
| US-10259208-B2 | Three-dimensional shaped object manufacturing device, method for manufacturing three-dimensional shaped object, and three-dimensional shaped object | SEIKO EPSON CORPORATION (JP) | 2019-04-16 | — | — | US | disclosed |
| US-20190054704-A1 | THREE DIMENSIONAL MOLD OBJECT MANUFACTURING APPARATUS, METHOD FOR MANUFACTURING THREE DIMENSIONAL MOLD OBJECT, AND THREE DIMENSIONAL MOLD OBJECT | SEIKO EPSON CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20080311285-A1 | CONTACT HOLE FORMING METHOD, CONDUCTING POST FORMING METHOD, WIRING PATTERN FORMING METHOD, MULTILAYERED WIRING SUBSTRATE PRODUCING METHOD, ELECTRO-OPTICAL DEVICE PRODUCING METHOD, AND ELECTRONIC APPARATUS PRODUCING METHOD | SEIKO EPSON CORPORATION (JP) | 2008-12-18 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| CN-1713787-A | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORP (JP) | 2005-12-28 | — | — | CN | disclosed |
| US-6294313-B1 | PHOTOCATALYST-CONTAINING LAYER CONTAINING A MATERIAL OF WHICH THE WETTABILITY IS VARIABLE THROUGH PHOTOCATALYTIC ACTION UPON PATTERN-WISE EXPOSURE. | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-09-25 | — | — | US | disclosed |
| WO-1998045368-A1 | OLEFIN (CO-)POLYMER COMPOSITIONS AND METHOD OF PRODUCING THE SAME | CHISSO CORPORATION (JP) | 1998-10-15 | — | — | WO | disclosed |