Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.54 |
| ▸ | HTT | P42858 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 3/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | ESR1 | P03372 | 1/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 3/20 | 0.47 |
| ▸ | GAA | P10253 | 1/20 | 0.47 |
| ▸ | SRD5A2 | P31213 | 2/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.45 |
| ▸ | ACHE | P22303 | 1/20 | 0.45 |
| ▸ | PPARG | P37231 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11472200 | 0.92 | ATM (0.66) | ATMHTTALDH1A1SMN1; SMN2L3MBTL1 | |
| SCHEMBL11474331 | 0.90 | MAOB (0.54) | ATMHTTALDH1A1SMN1; SMN2LMNA | |
| SCHEMBL11490185 | 0.90 | HPGD (0.59) | ATMALDH1A1L3MBTL1MAPTLMNA | |
| SCHEMBL10709493 | 0.86 | CES2 (0.52) | ATMALDH1A1SMN1; SMN2LMNAHPGD | |
| SCHEMBL11472881 | 0.85 | ATM (0.43) | ATMHTTALDH1A1SMN1; SMN2L3MBTL1 | |
| SCHEMBL566413 | 0.84 | NPC1 (0.62) | ALDH1A1SMN1; SMN2HPGDRAB9ANPC1 | |
| SCHEMBL1104605 | 0.84 | KMT2A (0.61) | HTTALDH1A1SMN1; SMN2L3MBTL1MAPT | |
| SCHEMBL19901113 | 0.84 | MAOB (0.54) | HTTALDH1A1SMN1; SMN2L3MBTL1MAPT | |
| SCHEMBL8280582 | 0.83 | PARP10 (0.63) | ALDH1A1MAPTRAB9ANPC1KMT2A | |
| SCHEMBL2607023 | 0.83 | LOXL2 (0.66) | ALDH1A1SMN1; SMN2L3MBTL1MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240329525-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-10-03 | — | — | US | disclosed |
| US-20240210827-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-115185157-A | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device | 旭化成株式会社 | 2022-10-14 | — | — | CN | disclosed |
| US-10990008-B2 | Resin composition | TORAY INDUSTRIES, INC. (JP) | 2021-04-27 | — | — | US | disclosed |
| US-20200409263-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-12-31 | — | — | US | disclosed |
| US-10831101-B2 | Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-11-10 | — | — | US | disclosed |
| US-20190113845-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING CURED RELIEF PATTERN, AND SEMICONDUCTOR APPARATUS | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-04-18 | — | — | US | disclosed |
| US-20190086800-A1 | RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2019-03-21 | — | — | US | disclosed |
| EP-0659737-B1 | Catecholamine surrogates useful as beta 3 agonists | BRISTOL MYERS SQUIBB CO (US) | 2003-03-26 | — | — | EP | disclosed |
| EP-0659737-A2 | Catecholamine surrogates useful as B3 agonists | BRISTOL-MYERS SQUIBB COMPANY (US) | 1995-06-28 | — | — | EP | disclosed |
| US-5122442-A | Water soluble binder; photosensitive compound | HOECHST CELANESE CORPORATION (US) | 1992-06-16 | — | — | US | disclosed |
| EP-0212482-B1 | PROCESS FOR OBTAINING NEGATIVE IMAGES FROM POSITIVE PHOTORESISTS | HOECHST CELANESE CORPORATION (US) | 1989-04-19 | — | — | EP | disclosed |
| EP-0106156-B1 | LIGHT-SENSITIVE COMPOSITION | HOECHST CELANESE CORPORATION (US) | 1988-12-21 | — | — | EP | disclosed |
| EP-0212482-A2 | Process for obtaining negative images from positive photoresists | HOECHST CELANESE CORPORATION (US) | 1987-03-04 | — | — | EP | disclosed |
| EP-0061150-B1 | LIGHT-SENSITIVE POLYCONDENSATION PRODUCT, PROCESS FOR ITS PREPARATION AND LIGHT-SENSITIVE RECORDING MATERIAL CONTAINING THE SAME | AMERICAN HOECHST CORPORATION (US) | 1986-10-15 | — | — | EP | disclosed |
| EP-0106156-A2 | Light-sensitive composition | HOECHST CELANESE CORPORATION (US) | 1984-04-25 | — | — | EP | disclosed |
| US-4436804-A | Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith | AMERICAN HOECHST CORPORATION (US) | 1984-03-13 | — | — | US | disclosed |
| EP-0061150-A1 | Light-sensitive polycondensation product, process for its preparation and light-sensitive recording material containing the same | AMERICAN HOECHST CORPORATION (US) | 1982-09-29 | — | — | EP | disclosed |
| US-4199420-A | ETHYLENICALLY UNSATURATED MONOMERS | STAUFFER CHEMICAL COMPANY (US) | 1980-04-22 | — | — | US | disclosed |