SCHEMBL7044262

SCHEMBL7044262

CC(=CCc1cccc(O)c1)C(=O)O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTBP2 P56545 1/20 0.47
IDO1 P14902 1/20 0.44
ENPP2 Q13822 1/20 0.43
CHRM2 P08172 2/20 0.42
CHRM1 P11229 2/20 0.42
CHRM3 P20309 2/20 0.42
GRIA2 P42262 1/20 0.41
HSD17B1 P14061 1/20 0.41
HSD17B2 P37059 1/20 0.41
DRD2 P14416 1/20 0.41
DRD1 P21728 1/20 0.41
TAAR1 Q96RJ0 1/20 0.41
CYP2C9 P11712 1/20 0.41
OPRK1 P41145 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
PKM P14618 1/20 0.40
ALOX15 P16050 1/20 0.40
NFKB1 P19838 1/20 0.40
MAPK1 P28482 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1137523 0.84 CHRM2 (0.47) CTBP2IDO1CHRM2CHRM1CHRM3
SCHEMBL1137527 0.84 CHRM2 (0.47) CTBP2IDO1CHRM2CHRM1CHRM3
SCHEMBL5487172 0.83 CTBP2 (0.50) CTBP2TAAR1CYP2C9CYP3A4
SCHEMBL30528 0.82 CYP2C9 (0.51) CYP2C9CYP3A4PKM
SCHEMBL30530 0.82 CYP2C9 (0.51) CYP2C9CYP3A4PKM
SCHEMBL15733040 0.82 PTGS2 (0.48) GRIA2CYP2C9
Iodide SCHEMBL3761279 0.80 CYP2C9 (0.50) CYP2C9CYP3A4PKM
SCHEMBL11287915 0.80 KMT2A (0.47) HSD17B1HSD17B2CYP2C9ALOX15MAPK1
SCHEMBL16226182 0.80 L3MBTL1 (0.50) CYP2C9CYP3A4MAPK1HIF1A
SCHEMBL6441999 0.80 MEN1 (0.54) CTBP2CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6703182-B1 PHOTOPOLYMERISABLE COMPOSITIONS COMPRISING SAID COMPOUNDS AND USE OF THE COMPOUNDS AS LATENT ACIDS, WHICH CAN BE ACTIVATED BY IRRADIATION WITH LIGHT CIBA SPECIALTY CHEMICALS CORPORATION 2004-03-09 US disclosed
EP-0571330-B1 High-resolution photoresist with enhanced sensitivity for I-line exposure CIBA GEIGY AG (CH) 1999-04-07 EP disclosed
US-5759740-A High resolution i-line photoresist of high sensitivity CIBA SPECIALTY CHEMICALS CORPORATION (US) 1998-06-02 US disclosed
US-5627011-A High resolution i-line photoresist of high sensitivity CIBA-GEIGY CORPORATION (US) 1997-05-06 US disclosed
EP-0571330-A1 High-resolution photoresist with enhanced sensitivity for I-line exposure CIBA-GEIGY AG (CH) 1993-11-24 EP disclosed