Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 2/20 | 0.37 |
| ▸ | AR | P10275 | 1/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.35 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28062717 | 0.89 | LMNA (0.35) | ESR1ARESR2 | |
| SCHEMBL28062928 | 0.89 | CYP2A6 (0.35) | ESR1ARESR2 | |
| SCHEMBL15737013 | 0.89 | CA1 (0.33) | ESR1ARESR2NR1H2NR1H3 | |
| SCHEMBL27743566 | 0.89 | ESR1 (0.56) | ESR1ARESR2 | |
| SCHEMBL296205 | 0.87 | CA4 (0.35) | ESR1ESR2 | |
| SCHEMBL15736944 | 0.87 | NR1H2 (0.41) | NR1H2NR1H3 | |
| SCHEMBL15738561 | 0.83 | CYP17A1 (0.36) | ESR1 | |
| SCHEMBL2240468 | 0.83 | ALDH1A1 (0.42) | — | |
| SCHEMBL15737258 | 0.82 | KIF11 (0.48) | NR1H2NR1H3 | |
| SCHEMBL15734798 | 0.80 | ESR1 (0.31) | ESR1ARESR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20040028978-A1 | Proton conducting membrane, method for producing the same, and fuel cell using the same | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2004-02-12 | — | — | US | disclosed |
| EP-1334993-A2 | Proton conducting membrane, method for producing the same, and fuel cell using the same | National Institute of Advanced Industrial Science and Technology (JP) | 2003-08-13 | — | — | EP | disclosed |