SCHEMBL704494

SCHEMBL704494

COC1CCC(C=C(C)C(=O)O)CC1

nearest known ligand 0.35

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
GABRA1 P14867 1/20 0.33
TSHR P16473 1/20 0.33
GABRG2 P18507 1/20 0.33
RXRA P19793 1/20 0.33
GABRB3 P28472 1/20 0.33
RXRB P28702 1/20 0.33
GABRB2 P47870 1/20 0.33
RXRG P48443 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5606967 0.85 ALDH1A1 (0.40) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL701151 0.85
SCHEMBL7681661 0.85
SCHEMBL5606971 0.85 ALDH1A1 (0.40) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL6901108 0.81 ALDH1A1 (0.32) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL2114577 0.80 ALDH1A1 (0.31) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL6474031 0.78 ALDH1A1 (0.37) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL1052754 0.78 ALDH1A1 (0.39) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL1052747 0.78 ALDH1A1 (0.39) ALDH1A1GABRA1TSHRGABRG2RXRA
SCHEMBL134842 0.78 ALDH1A1 (0.37) ALDH1A1GABRA1TSHRGABRG2RXRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240045329-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND TORAY INDUSTRIES, INC. (JP) 2024-02-08 US disclosed
US-9788420-B2 Substrate and touch panel member using same TORAY INDUSTRIES, INC. (JP) 2017-10-10 US disclosed
US-9690197-B2 Negative-type photosensitive white composition for touch panel, touch panel and touch panel production method TORAY INDUSTRIES, INC. (JP) 2017-06-27 US disclosed
US-9510444-B2 2016-11-29 US disclosed
US-9500950-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2016-11-22 US disclosed
US-20160161847-A1 NEGATIVE-TYPE PHOTOSENSITIVE WHITE COMPOSITION FOR TOUCH PANEL, TOUCH PANEL AND TOUCH PANEL PRODUCTION METHOD TORAY INDUSTRIES, INC. (JP) 2016-06-09 US disclosed
US-20160062237-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2016-03-03 US disclosed
US-20150366055-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES, INC. (JP) 2015-12-17 US disclosed
US-9213236-B2 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition JSR CORPORATION (JP) 2015-12-15 US disclosed
US-20150125680-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES, INC. (JP) 2015-05-07 US disclosed
US-7897821-B2 Sulfonium compound JSR CORPORATION (JP) 2011-03-01 US disclosed
US-20100324329-A1 COMPOUND JSR CORPORATION (JP) 2010-12-23 US disclosed
US-20100285405-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-11-11 US disclosed
US-20100239981-A1 POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-09-23 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100068650-A1 POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION USING THE COMPOSITION JSR CORPORATION (JP) 2010-03-18 US disclosed
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN JSR CORPORATION (JP) 2010-03-11 US disclosed
US-20090202945-A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-08-13 US disclosed
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-20040241580-A1 Radiation-sensitive resin composition NISHIMURA YUKIO (JP) 2004-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100063232-A1 POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN ASIC1, RER1, RPS10 ALDH1A1 2200/4885GABRA1 209/4885TSHR 941/4885
US-20100324329-A1 COMPOUND AFF2, AFF1, AFF4 ALDH1A1 2783/4885GABRA1 419/4885TSHR 890/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.