SCHEMBL704598

SCHEMBL704598

C[Si](Oc1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA4 P22748 1/20 0.42
LTA4H P09960 3/20 0.39
TSHR P16473 1/20 0.39
ESR1 P03372 1/20 0.38
ESR2 Q92731 1/20 0.38
NPC1 O15118 4/20 0.33
RAB9A P51151 4/20 0.33
SMN1; SMN2 Q16637 3/20 0.33
TDP1 Q9NUW8 3/20 0.33
TP53 P04637 1/20 0.33
NFKB1 P19838 1/20 0.33
NFKB2 Q00653 1/20 0.33
RELA Q04206 1/20 0.33
KCNA3 P22001 1/20 0.33
KMT2A Q03164 2/20 0.33
MEN1 O00255 1/20 0.33
CA5A P35218 1/20 0.32
CA5B Q9Y2D0 1/20 0.32
L3MBTL1 Q9Y468 2/20 0.32
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21086726 0.88 NPC1 (0.37) CA4LTA4HTSHRESR1ESR2
SCHEMBL28665119 0.85 MAOA (0.48) TSHRNPC1RAB9ASMN1; SMN2TDP1
SCHEMBL7133959 0.80 ALDH1A1 (0.45) TSHRTP53RELAKMT2AMEN1
SCHEMBL708546 0.80 CA4 (0.42) CA4LTA4HTSHRESR1ESR2
SCHEMBL707283 0.80 CA4 (0.42) CA4LTA4HTSHRESR1ESR2
SCHEMBL9331294 0.77 CA4 (0.43) CA4LTA4HTSHRESR1ESR2
SCHEMBL2233576 0.77 ESR1 (0.39) CA4TSHRESR1ESR2NR1H2
SCHEMBL18108288 0.76 CA4 (0.39) CA4LTA4HTSHRESR1ESR2
SCHEMBL18108134 0.76 CA4 (0.39) CA4LTA4HTSHRESR1ESR2
SCHEMBL1130763 0.76 CA4 (0.39) CA4LTA4HTSHRESR1ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7129311-B2 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-10-31 US claimed
US-20060159861-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-07-20 US claimed
EP-1573086-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES Arch Specialty Chemicals, Inc. (US) 2005-09-14 EP claimed
US-20040127070-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. 2004-07-01 US claimed
WO-2004027110-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES ARCH SPECIALTY CHEMICALS, INC. (US) 2004-04-01 WO claimed
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
CN-101319090-B Aryl(thio)ether aryl polysiloxane composition and methods for making and using same ROHM & HAAS 2012-07-18 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-7531590-B2 Additives to prevent degradation of alkyl-hydrogen siloxanes FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2009-05-12 US disclosed
CN-101319090-A Aryl(thio)ether aryl polysiloxane composition and methods for making and using same ROHM & HAAS (US) 2008-12-10 CN disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060270787-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes VERSUM MATERIALS US, LLC 2006-11-30 US disclosed
US-7129311-B2 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-10-31 US disclosed
US-20060159861-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. (US) 2006-07-20 US disclosed
EP-1573086-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES Arch Specialty Chemicals, Inc. (US) 2005-09-14 EP disclosed
US-20040127070-A1 Additives to prevent degradation of alkyl-hydrogen siloxanes ARCH SPECIALTY CHEMICALS, INC. 2004-07-01 US disclosed
WO-2004027110-A2 ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES ARCH SPECIALTY CHEMICALS, INC. (US) 2004-04-01 WO disclosed