Succinic Acid

Succinic Acid

SCHEMBL7046705

C=CC(=O)O.CC(CO)(CO)CO.O=C(O)CCC(=O)O

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRB1CDK4CDK6CHRM2CHRM3DPP4DRD2DRD3DRD4EGFRHRH1HTR1BHTR1DHTR1FHTR2AHTR2CHTR4SLC6A2SLC6A4

The experimentally established mechanism targets of Succinic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 known ✓ P23975 1/20 0.38
SLC6A4 known ✓ P31645 1/20 0.38
LMNA P02545 3/20 0.43
EGLN1 Q9GZT9 4/20 0.39
ALKBH5 Q6P6C2 1/20 0.39
SUCNR1 Q9BXA5 1/20 0.39
HSD17B10 Q99714 2/20 0.39
ALOX15 P16050 1/20 0.39
CYP2C19 P33261 3/20 0.38
BLM P54132 2/20 0.38
CYP2D6 P10635 2/20 0.38
SLC6A3 Q01959 1/20 0.38
MEN1 O00255 1/20 0.38
TSHR P16473 1/20 0.38
NFKB1 P19838 1/20 0.38
KMT2A Q03164 1/20 0.38
SLC15A2 Q16348 1/20 0.37
ABCC4 O15439 1/20 0.34
MAPT P10636 1/20 0.34
CYP3A4 P08684 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL29670994 0.91 LMNA (0.53) LMNAHSD17B10ALOX15CYP2C19TSHR
Acrylic Acid SCHEMBL3680633 0.91 LMNA (0.53) LMNAHSD17B10ALOX15CYP2C19TSHR
Acrylic Acid SCHEMBL180610 0.91 LMNA (0.53) LMNAHSD17B10ALOX15CYP2C19TSHR
Acrylic Acid SCHEMBL11312682 0.91 LMNA (0.53) LMNAHSD17B10ALOX15CYP2C19TSHR
Sebacic Acid SCHEMBL10894955 0.90 ABCC4 (0.48) LMNAHSD17B10ALOX15CYP2C19BLM
Malonic Acid SCHEMBL10594936 0.87 ALOX15 (0.48) LMNAHSD17B10ALOX15CYP2C19CYP2D6
Acrylic Acid SCHEMBL11685831 0.86 LMNA (0.48) LMNAHSD17B10ALOX15CYP2C19TSHR
Succinic Acid SCHEMBL27487395 0.83 ALDH1A1 (0.39) LMNAEGLN1ALKBH5SUCNR1HSD17B10
Succinic Acid SCHEMBL10897257 0.82 LMNA (0.48) LMNAEGLN1ALKBH5SUCNR1HSD17B10
Succinic Acid SCHEMBL231928 0.82 LMNA (0.48) LMNAEGLN1ALKBH5SUCNR1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024135751-A1 COMPOSITION FOR HARD COAT LAYER FORMATION, AND HARD COAT FILM artience株式会社 2024-06-27 WO disclosed
CN-118119863-A Hard coating film and method for producing same 爱天思株式会社 2024-05-31 CN disclosed
WO-2023068040-A1 HARD COAT FILM AND METHOD FOR MANUFACTURING SAME 東洋インキSCホールディングス株式会社 2023-04-27 WO disclosed
CN-106338896-B Intermediate transfer belt and image forming apparatus 柯尼卡美能达株式会社 2019-07-05 CN disclosed
CN-105278294-B Transfer member and image forming apparatus 柯尼卡美能达株式会社 2019-06-21 CN disclosed
CN-109465998-A The manufacturing method of intermediate transfer belt and the manufacturing device of intermediate transfer belt 柯尼卡美能达株式会社 2019-03-15 CN disclosed
US-20190076873-A1 MANUFACTURING METHOD FOR INTERMEDIATE TRANSFER BELT AND MANUFACTURING DEVICE FOR INTERMEDIATE TRANSFER BELT Konica Minolta, Inc. (JP) 2019-03-14 US disclosed
CN-105807591-B Middle transfer body and the image forming apparatus for having the middle transfer body 柯尼卡美能达株式会社 2018-10-16 CN disclosed
CN-106338896-A INTERMEDIATE TRANSFERRING BELT AND IMAGE-FORMING APPARATUS 柯尼卡美能达株式会社 2017-01-18 CN disclosed
US-9519082-B2 Microscopic roughness structure with protective film and method thereof MITSUBISHI RAYON CO., LTD. (JP) 2016-12-13 US disclosed
US-20010027231-A1 Coating agent, and resin molded article having coated layer MITSUBISHI RAYON CO., LTD. (JP) 2001-10-04 US disclosed
US-6262214-B1 TRANSPARENCY, HEAT-RESISTANCE AND MECHANICAL STRENGTH; USED TO MAKE LENSES, OPTICAL DISKS, OPTICAL FIBERS MITSUBISHI RAYON CO., LTD. (JP) 2001-07-17 US disclosed
US-6228499-B1 POLYETHYLENE GLYCOL DI(METH)ACRYLATE PROTECTIVE COATING MITSUBISHI RAYON CO., LTD. (JP) 2001-05-08 US disclosed
EP-0936227-A1 LOWLY BIREFRINGENT POLYMER, PROCESS FOR THE PRODUCTION THEREOF, AND OPTICAL PICKUP LENS MITSUBISHI RAYON CO., LTD. (JP) 1999-08-18 EP disclosed
CN-1224179-A Plastic substrates for electronic display applications ROHM & HAAS (US) 1999-07-28 CN disclosed
EP-0915105-A1 Plastic substrates for electronic display applications ROHM AND HAAS COMPANY (US) 1999-05-12 EP disclosed
EP-0566353-B1 Photopolymerizable composition MITSUBISHI RAYON CO (JP) 1998-08-19 EP disclosed
EP-0832917-A1 MOLDED RESIN ARTICLES HAVING MARPROOF ORGANIC HARD COAT LAYER AND NONFOGGING ORGANIC HARD COAT LAYER, PROCESS FOR THE PRODUCTION OF THE SAME, AND COATING MATERIALS THEREFOR MITSUBISHI RAYON CO., LTD. (JP) 1998-04-01 EP disclosed
US-5635544-A CONSISTS OF ULTRAVIOLET CURABLE HYDROLYZED SILICA AND HYDROLYZATE OF ACRYLATED OR VINYL ALKOXYSILANE POLYMER, POLYFUNCTIONAL METHACRYLOYLOXY MONOMER, PHOTOPOLYMERIZATION INITIATOR MITSUBISHI RAYON CO., LTD. (JP) 1997-06-03 US disclosed
EP-0566353-A1 Photopolymerizable composition MITSUBISHI RAYON COMPANY LTD. (JP) 1993-10-20 EP disclosed