SCHEMBL705039

SCHEMBL705039

CCC(CO[SiH3])(c1ccccc1)c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.39
ESR2 Q92731 2/20 0.39
KCNN4 O15554 4/20 0.38
MAPK1 P28482 1/20 0.37
TAAR1 Q96RJ0 1/20 0.34
ALDH1A1 P00352 1/20 0.34
ALOX15 P16050 1/20 0.34
SIGMAR1 Q99720 1/20 0.33
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
KIF11 P52732 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3482135 0.84 ESR1 (0.42) ESR1ESR2KCNN4MAPK1TAAR1
SCHEMBL3481753 0.81 ESR1 (0.46) ESR1ESR2KCNN4SIGMAR1CHRM2
SCHEMBL4078046 0.81 MAPK1 (0.33) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL827345 0.79 ESR1 (0.56) ESR1ESR2KCNN4MAPK1TAAR1
SCHEMBL4079894 0.79 TSHR (0.36) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL4082790 0.79 MAPK1 (0.32) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL704242 0.79 KCNN4 (0.38) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL11297940 0.76 ESR1 (0.48) ESR1ESR2KCNN4MAPK1TAAR1
SCHEMBL6232916 0.74 SIGMAR1 (0.42) ESR1ESR2KCNN4MAPK1TAAR1
SCHEMBL109031 0.74 TAAR1 (0.52) ESR1ESR2KCNN4MAPK1TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3812428-B1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC IP MAN CO LTD (JP) 2025-12-03 EP disclosed
CN-112424290-B Colloid structure, colloid multiple structure, and method for producing colloid structure 松下知识产权经营株式会社 2023-08-22 CN disclosed
US-11353642-B2 Optical filter, multiplex optical filter, and light emitting device and illumination system using the same PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2022-06-07 US disclosed
CN-114085382-A Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2022-02-25 CN disclosed
CN-109715680-B Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions 株式会社普利司通 2021-10-19 CN disclosed
US-20210246330-A1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-08-12 US disclosed
US-20210199865-A1 OPTICAL FILTER, MULTIPLEX OPTICAL FILTER, AND LIGHT EMITTING DEVICE AND ILLUMINATION SYSTEM USING THE SAME PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-07-01 US disclosed
EP-3812428-A1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE Panasonic Intellectual Property Management Co., Ltd. (JP) 2021-04-28 EP disclosed
EP-3805823-A1 OPTICAL FILTER, MULTIPLEX-OPTICAL FILTER, AND LIGHT-EMITTING DEVICE AND ILLUMINATION SYSTEM USING SUCH FILTERS Panasonic Intellectual Property Management Co., Ltd. (JP) 2021-04-14 EP disclosed
CN-112424290-A Colloidal structure, colloidal multiple structure, and method for producing colloidal structure 松下知识产权经营株式会社 2021-02-26 CN disclosed
CN-112136065-A Optical filter, multiple optical filter, and light-emitting device and lighting system using the same 松下知识产权经营株式会社 2020-12-25 CN disclosed
US-9546237-B2 Stabilization of polymers that contain a hydrolyzable functionality BRIDGESTONE CORPORATION (JP) 2017-01-17 US disclosed
US-20130331520-A1 STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY BRIDGESTONE CORPORATION (JP) 2013-12-12 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-7604866-B2 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2009-10-20 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060269724-A1 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2006-11-30 US disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed