Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 3/20 | 0.46 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.46 |
| ▸ | KIF11 | P52732 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.36 |
| ▸ | LTA4H | P09960 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.33 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.33 |
| ▸ | EBP | Q15125 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3482135 | 0.89 | ESR1 (0.42) | ESR1ESR2SIGMAR1MEN1KMT2A | |
| SCHEMBL3481387 | 0.84 | ESR1 (0.49) | ESR1ESR2KIF11SIGMAR1LTA4H | |
| SCHEMBL8158952 | 0.83 | ESR1 (0.59) | ESR1ESR2KIF11SIGMAR1LTA4H | |
| SCHEMBL7543600 | 0.82 | ESR1 (0.63) | ESR1ESR2KIF11SIGMAR1LTA4H | |
| SCHEMBL10612619 | 0.82 | KIF11 (0.53) | KIF11 | |
| SCHEMBL705822 | 0.82 | KIF11 (0.36) | ESR1ESR2KIF11SIGMAR1LTA4H | |
| SCHEMBL705039 | 0.81 | ESR1 (0.39) | ESR1ESR2KIF11SIGMAR1CHRM2 | |
| SCHEMBL3482113 | 0.81 | CYP2C19 (0.38) | ESR1ESR2KIF11SIGMAR1LTA4H | |
| SCHEMBL7781763 | 0.81 | ESR1 (0.55) | ESR1ESR2KIF11SIGMAR1LTA4H | |
| SCHEMBL3481837 | 0.79 | KIF11 (0.35) | ESR1ESR2KIF11SIGMAR1LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |