SCHEMBL704242

SCHEMBL704242

CCC(CC)(CO[SiH3])c1ccccc1

nearest known ligand 0.43

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 4/20 0.38
MAPK1 P28482 1/20 0.37
TAAR1 Q96RJ0 1/20 0.34
ALDH1A1 P00352 1/20 0.34
ALOX15 P16050 1/20 0.34
SIGMAR1 Q99720 1/20 0.33
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CHRM3 P20309 1/20 0.32
KIF11 P52732 1/20 0.31
CYP2C19 P33261 1/20 0.31
HIF1A Q16665 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3481873 0.89 SCN1A (0.33) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL3481837 0.86 KIF11 (0.35) KCNN4SIGMAR1KIF11
SCHEMBL6696762 0.86 KIF11 (0.38) KCNN4TAAR1KIF11CYP2C19
SCHEMBL707031 0.84 KCNN4 (0.35) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL705822 0.81 KIF11 (0.36) KCNN4MAPK1SIGMAR1KIF11
SCHEMBL706645 0.80 KCNN4 (0.35) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL2170468 0.79 KCNN4 (0.48) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL705039 0.79 ESR1 (0.39) KCNN4MAPK1TAAR1ALDH1A1ALOX15
SCHEMBL9248761 0.78 KCNN4 (0.32) KCNN4MAPK1
SCHEMBL706328 0.77 SIGMAR1 (0.36) KCNN4MAPK1TAAR1ALDH1A1ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN claimed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN claimed
EP-3812428-B1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC IP MAN CO LTD (JP) 2025-12-03 EP disclosed
CN-115181223-B Low-gloss matte auxiliary agent, preparation method thereof and molded body 铨盛聚碳科技股份有限公司 2023-08-29 CN disclosed
CN-112424290-B Colloid structure, colloid multiple structure, and method for producing colloid structure 松下知识产权经营株式会社 2023-08-22 CN disclosed
CN-115181223-A Low-gloss matte auxiliary agent, preparation method thereof and formed body 铨盛聚碳科技股份有限公司 2022-10-14 CN disclosed
US-11353642-B2 Optical filter, multiplex optical filter, and light emitting device and illumination system using the same PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2022-06-07 US disclosed
CN-114085382-A Hydrogen-containing poly titanium boron siloxane flame retardant, and preparation method and application thereof 铨盛聚碳科技股份有限公司 2022-02-25 CN disclosed
US-20210246330-A1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-08-12 US disclosed
US-20210199865-A1 OPTICAL FILTER, MULTIPLEX OPTICAL FILTER, AND LIGHT EMITTING DEVICE AND ILLUMINATION SYSTEM USING THE SAME PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2021-07-01 US disclosed
EP-3812428-A1 COLLOIDAL STRUCTURE, MULTI-COLLOIDAL STRUCTURE, AND PRODUCTION METHOD FOR COLLOIDAL STRUCTURE Panasonic Intellectual Property Management Co., Ltd. (JP) 2021-04-28 EP disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060269724-A1 Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance ASAHI KASEI KABUSHIKI KAISHA (JP) 2006-11-30 US disclosed
EP-1690839-A1 FLEXIBLE SUBSTRATE AND COATING LIQUID Sumitomo Corporation (JP) 2006-08-16 EP disclosed
US-20040077757-A1 Coating composition for use in producing an insulating thin film ASAHI KASEI KABUSHIKI KAISHA (JP) 2004-04-22 US disclosed
EP-0384774-B1 Semiconductor device encapsulant TOSHIBA KK (JP) 1997-01-22 EP disclosed
US-5258426-A Semiconductor device encapsulant KABUSHIKI KAISHA TOSHIBA (JP) 1993-11-02 US disclosed
EP-0384774-A2 Semiconductor device encapsulant KABUSHIKI KAISHA TOSHIBA (JP) 1990-08-29 EP disclosed
US-4428776-A SEPARATORS OF CARBON DIOXIDE FROM METHANE THE STANDARD OIL COMPANY (US) 1984-01-31 US disclosed
EP-0097424-A2 Cellulosic semipermeable membranes THE STANDARD OIL COMPANY (US) 1984-01-04 EP disclosed