Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | ATM | Q13315 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | FDPS | P14324 | 6/20 | 0.33 |
| ▸ | GGPS1 | O95749 | 3/20 | 0.33 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7758102 | 0.86 | LMNA (0.38) | CYP4F2CYP4A11MEN1MAPTKMT2A | |
| SCHEMBL20093567 | 0.83 | MAPT (0.43) | MEN1MAPTKMT2AATML3MBTL1 | |
| SCHEMBL27916266 | 0.82 | CA1 (0.42) | CYP4F2CYP4A11MEN1MAPTKMT2A | |
| SCHEMBL21166222 | 0.81 | MAPT (0.46) | MEN1MAPTKMT2AATML3MBTL1 | |
| SCHEMBL28343978 | 0.81 | MEN1 (0.39) | MEN1MAPTKMT2AATML3MBTL1 | |
| SCHEMBL703088 | 0.80 | CYP4F2 (0.46) | CYP4F2CYP4A11MEN1MAPTKMT2A | |
| SCHEMBL19509955 | 0.79 | CES2 (0.41) | MEN1MAPTKMT2AATML3MBTL1 | |
| SCHEMBL27898588 | 0.79 | MEN1 (0.53) | CYP4F2CYP4A11MEN1MAPTKMT2A | |
| SCHEMBL7059566 | 0.79 | CYP4F2 (0.33) | CYP4F2CYP4A11 | |
| SCHEMBL18612495 | 0.78 | MAPT (0.47) | MEN1MAPTKMT2AATML3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |