Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.34 |
| ▸ | RORA | P35398 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 7/20 | 0.32 |
| ▸ | CA1 | P00915 | 4/20 | 0.32 |
| ▸ | CA2 | P00918 | 4/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | GMNN | O75496 | 1/20 | 0.31 |
| ▸ | DRD1 | P21728 | 1/20 | 0.31 |
| ▸ | DRD3 | P35462 | 1/20 | 0.31 |
| ▸ | CCR2 | P41597 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7055117 | 0.99 | LMNA (0.37) | LMNAGAAACHEALDH1A1RORA | |
| SCHEMBL7052417 | 0.99 | LMNA (0.40) | LMNAGAAACHEALDH1A1RORA | |
| SCHEMBL7057650 | 0.97 | LMNA (0.39) | LMNAGAAACHEALDH1A1RORA | |
| SCHEMBL5439039 | 0.86 | ALDH1A1 (0.35) | GAAACHEALDH1A1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL7053442 | 0.86 | ACHE (0.40) | LMNAGAAACHEALDH1A1RORA | |
| SCHEMBL5433859 | 0.85 | ALDH1A1 (0.35) | GAAACHEALDH1A1CA1CA2 | |
| Trifluoromethanesulfonic Acid SCHEMBL3627234 | 0.84 | ALDH1A1 (0.34) | ALDH1A1CA1CA2 | |
| SCHEMBL2898445 | 0.84 | CA1 (0.33) | CA1CA2 | |
| SCHEMBL2904052 | 0.83 | CA1 (0.34) | CA1CA2 | |
| SCHEMBL5350460 | 0.83 | GAA (0.37) | GAAALDH1A1HSD11B1MAPTNPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023028249-A9 | ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-10-12 | — | — | WO | claimed |
| WO-2023076224-A9 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTORS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-06-15 | — | — | WO | claimed |
| WO-2023076251-A1 | MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION | GEMINATIO INC. (US) | 2023-05-04 | — | — | WO | claimed |
| WO-2023076224-A1 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTORS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-05-04 | — | — | WO | claimed |
| WO-2023028223-A1 | OPTIMIZATION FOR LOCAL CHEMICAL EXPOSURE | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028243-A1 | NARROW LINE CUT MASKING PROCESS | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028246-A1 | ANTI-SPACER BASED SELF-ALIGNED HIGH ORDER PATTERNING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028236-A1 | IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028244-A1 | GENERATION OF MULTILINE ETCH SUBSTRATES | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028245-A1 | SELF-ALIGNED BUILD-UP PROCESSING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023028249-A1 | ASSISTED FEATURE PLACEMENT IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | claimed |
| WO-2023076224-A9 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTORS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-06-15 | — | — | WO | disclosed |
| WO-2023076251-A1 | MULTI-LEVEL SELECTIVE PATTERNING FOR STACKED DEVICE CREATION | GEMINATIO INC. (US) | 2023-05-04 | — | — | WO | disclosed |
| WO-2023076224-A1 | CHEMICALLY SELECTIVE ADHESION AND STRENGTH PROMOTORS IN SEMICONDUCTOR PATTERNING | GEMINATIO, INC. (US) | 2023-05-04 | — | — | WO | disclosed |
| WO-2023028259-A1 | ENHANCED FIELD STITCHING WITH CORRECTIVE CHEMISTRY | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028244-A1 | GENERATION OF MULTILINE ETCH SUBSTRATES | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028243-A1 | NARROW LINE CUT MASKING PROCESS | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| WO-2023028236-A1 | IN-RESIST PROCESS FOR HIGH DENSITY CONTACT FORMATION | GEMINATIO, INC. (US) | 2023-03-02 | — | — | WO | disclosed |
| US-20030134227-A1 | Cyclic sulfonium and sulfoxonium photoacid generators and photoresists comprising same | SHIPLEY COMPANY, LLC | 2003-07-17 | — | — | US | disclosed |
| EP-1308781-A2 | Cyclic sulfonium and sulfoxonium photoacid generators and photoresists containing them | Shipley Co. L.L.C. (US) | 2003-05-07 | — | — | EP | disclosed |